SCHEMBL19922271

SCHEMBL19922271

C=CCC(N(CC)CC)[Pt](C)(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6288249 0.70 TSHR (0.30)
SCHEMBL21204351 0.67
Hydrochloric Acid SCHEMBL22771787 0.67 KDM4E (0.30)
SCHEMBL19922266 0.64
SCHEMBL1137701 0.62
SCHEMBL2563517 0.62
SCHEMBL10376904 0.61
SCHEMBL9683571 0.61 GRIK1 (0.37)
Sulfuric Acid SCHEMBL28423019 0.61 FDPS (0.31)
SCHEMBL8097848 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10465283-B2 Organoplatinum compound for use in the chemical deposition of platinum compound thin films TANAKA KIKINZOKU KOGYO K.K. (JP) 2019-11-05 US disclosed
EP-3296425-A1 CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL Tanaka Kikinzoku Kogyo K.K. (JP) 2018-03-21 EP disclosed
US-20180066357-A1 RAW MATERIAL FOR CHEMICAL DEPOSITION COMPOSED OF ORGANOPLATINUM COMPOUND, AND CHEMICAL DEPOSITION METHOD USING THE RAW MATERIAL FOR CHEMICAL DEPOSITION TANAKA KIKINZOKU KOGYO K.K. (JP) 2018-03-08 US disclosed