Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL31231811 | 0.90 | — | — | |
| Sulfuric Acid SCHEMBL29551565 | 0.87 | — | — | |
| SCHEMBL21204351 | 0.78 | — | — | |
| Sulfuric Acid SCHEMBL27839092 | 0.71 | MEN1 (0.33) | — | |
| SCHEMBL10376904 | 0.71 | — | — | |
| Sulfuric Acid SCHEMBL6419257 | 0.71 | — | — | |
| Sulfuric Acid SCHEMBL19285797 | 0.70 | TP53 (0.33) | — | |
| SCHEMBL28046281 | 0.70 | FDPS (0.33) | FDPS | |
| SCHEMBL149449 | 0.69 | — | — | |
| SCHEMBL15252640 | 0.69 | SLC22A6 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119234296-A | Polishing liquid, polishing method, method for manufacturing component, and method for manufacturing semiconductor component | 株式会社力森诺科 | 2024-12-31 | — | — | CN | disclosed |
| CN-119177446-A | Etching composition, method of etching metal-containing film using the same, and method of manufacturing semiconductor device using the same | 三星电子株式会社 | 2024-12-24 | — | — | CN | disclosed |
| CN-107849252-B | Copolymer of diallylamine and sulfur dioxide and method for producing same | 日东纺绩株式会社 | 2020-06-02 | — | — | CN | disclosed |