SCHEMBL1996408

SCHEMBL1996408

C[Si](C)(C)[NH3+].N#C[B-](C#N)(C#N)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30143480 0.74 ALDH1A1 (0.31)
Lithium Ion SCHEMBL31015808 0.74 ALDH1A1 (0.31)
SCHEMBL16758706 0.74 CA1 (0.33)
Lithium Ion SCHEMBL1997799 0.74 ALDH1A1 (0.31)
Potassium Ion SCHEMBL1466551 0.74 ALDH1A1 (0.31)
Ammonia Solution, Strong SCHEMBL1999906 0.74 ALDH1A1 (0.31)
SCHEMBL15212303 0.72 TSHR (0.40)
Tetramethylammonium Ion SCHEMBL1995405 0.72 CHRNB2 (0.33)
SCHEMBL16059828 0.69 ALDH1A1 (0.38)
SCHEMBL1996407 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9243013-B2 Ionic compound, method for producing the same, and ion-conductive material comprising the same NIPPON SHOKUBAI CO., LTD. (JP) 2016-01-26 US disclosed
US-20110150736-A1 IONIC COMPOUND, METHOD FOR PRODUCING THE SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING THE SAME NIPPON SHOKUBAI CO., LTD. (JP) 2011-06-23 US disclosed
EP-2327707-A1 IONIC COMPOUND, PROCESS FOR PRODUCING SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING SAME Nippon Shokubai Co., Ltd. (JP) 2011-06-01 EP disclosed