⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17472883 | 0.93 | KDM4E (0.31) | — | |
| SCHEMBL10336789 | 0.86 | HCAR2 (0.30) | — | |
| SCHEMBL221550 | 0.84 | — | — | |
| SCHEMBL221551 | 0.84 | — | — | |
| SCHEMBL15005422 | 0.83 | TSHR (0.32) | — | |
| Ammonia Solution, Strong SCHEMBL10537654 | 0.82 | ALDH1A1 (0.35) | — | |
| SCHEMBL4961102 | 0.79 | ALDH1A1 (0.37) | — | |
| SCHEMBL379095 | 0.79 | ALDH1A1 (0.37) | — | |
| SCHEMBL8583779 | 0.79 | — | — | |
| SCHEMBL8509569 | 0.78 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022112459-A1 | LIGHT EMITTING POLYMER MATERIAL PARTICLE | MERCK PATENT GMBH (DE) | 2022-06-02 | — | — | WO | disclosed |
| WO-2022090444-A1 | PHOSPHOR | MERCK PATENT GMBH (DE) | 2022-05-05 | — | — | WO | disclosed |
| WO-2022013116-A1 | PHOSPHOR | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | WO | disclosed |
| WO-2022012810-A1 | PHOSPHOR | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | WO | disclosed |
| WO-2022013049-A1 | METHOD FOR FABRICATING A PARTICLE | MERCK PATENT GMBH (DE) | 2022-01-20 | — | — | WO | disclosed |
| EP-3911714-A1 | METHOD FOR MODULATING A CONDITION OF A BIOLOGICAL CELL | Merck Patent GmbH (DE) | 2021-11-24 | — | — | EP | disclosed |
| WO-2021160706-A1 | METHOD FOR THE PREPARATION OF A PARTICLE OF COATED PHOSPHOR | MERCK PATENT GMBH (DE) | 2021-08-19 | — | — | WO | disclosed |
| WO-2021099233-A1 | METHOD FOR FABRICATING A PARTICLE | MERCK PATENT GMBH (DE) | 2021-05-27 | — | — | WO | disclosed |
| WO-2021099351-A1 | METHOD FOR FABRICATING A PARTICLE | MERCK PATENT GMBH (DE) | 2021-05-27 | — | — | WO | disclosed |
| EP-3530714-B1 | A COMPOSITION, COLOR CONVERTING SHEET AND LIGHT EMITTING DIODE DEVICE | MERCK PATENT GMBH (DE) | 2021-04-14 | — | — | EP | disclosed |
| US-8426741-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120138348-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2012-06-07 | — | — | US | disclosed |
| US-8171628-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110189470-A1 | CURABLE RESIN COMPOSITION AND OPTICAL FILM | CHISSO CORPORATION (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110165514-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20110147054-A1 | PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND CONDUCTIVE FILM SUBSTRATE | RESONAC CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20080206487-A1 | Ink-jet ink and ink-jet recording method | KONICA MINOLTA HOLDINGS, INC. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-7375150-B2 | Thermo stability, is free from the problem of bleeding-out, exhibits its effect independently of humidity, has immediate effectiveness; electrical resistance | SANKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060141381-A1 | Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition | HITACHI CHEMICAL CO., LTD. (JP) | 2006-06-29 | — | — | US | disclosed |
| US-20040175573-A1 | Anti-static composition and method for production thereof | SANKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2004-09-09 | — | — | US | disclosed |