Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4961102 | 1.00 | ALDH1A1 (0.37) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL226695 | 0.93 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL4398992 | 0.90 | ALDH1A1 (0.35) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2637237 | 0.89 | ALDH1A1 (0.34) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL8583775 | 0.84 | ALDH1A1 (0.40) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL8583776 | 0.84 | ALDH1A1 (0.40) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2764469 | 0.81 | ALDH1A1 (0.40) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL434900 | 0.80 | ALDH1A1 (0.33) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL2785110 | 0.80 | THRB (0.33) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL1998152 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070178263-A1 | Binder with barrier properties | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2007-08-02 | — | — | US | claimed |
| EP-1781746-A2 | BONDING AGENT AND NANOPARTICLES WITH BARRIER PROPERTIES | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2007-05-09 | — | — | EP | claimed |
| US-7156944-B2 | Fusible adhesives crosslinkable by radiation | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2007-01-02 | — | — | US | claimed |
| WO-2006015659-A2 | BONDING AGENT AND NANOPARTICLES WITH BARRIER PROPERTIES | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2006-02-16 | — | — | WO | claimed |
| US-20050165164-A1 | Fusible adhesives crosslinkable by radiation | HENKEL AG & CO. KGAA (DE) | 2005-07-28 | — | — | US | claimed |
| EP-3808811-B1 | COMPOSITION FOR OPTICAL FILM, OPTICAL FILM AND DISPLAY DEVICE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2024-06-26 | — | — | EP | disclosed |
| US-12009555-B2 | Radical-curable seal member for fuel cell | SUMITOMO RIKO COMPANY LIMITED (JP) | 2024-06-11 | — | — | US | disclosed |
| US-11999157-B2 | Transfer film, laminate, acoustic speaker, and method for producing laminate | FUJIFILM CORPORATION (JP) | 2024-06-04 | — | — | US | disclosed |
| EP-4366003-A1 | RADICAL-CURABLE SEALING MEMBER FOR FUEL CELLS | Sumitomo Riko Company Limited (JP) | 2024-05-08 | — | — | EP | disclosed |
| WO-2024088029-A1 | MODIFIED DIALLYL PHTHALATE RESIN COMPOUND, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 常州强力电子新材料股份有限公司 | 2024-05-02 | — | — | WO | disclosed |
| EP-3743449-B1 | SEMI-FINISHED PRODUCTS BASED ON DUAL CROSS-LINKING MECHANISM | COVESTRO DEUTSCHLAND AG (DE) | 2024-04-17 | — | — | EP | disclosed |
| WO-2024057985-A1 | ANTI-GLARE LAMINATE AND METHOD FOR MANUFACTURING SAME | 三菱瓦斯化学株式会社 | 2024-03-21 | — | — | WO | disclosed |
| WO-2002034858-A1 | REACTIVE ADHESIVE WITH A LOW MONOMER CONTENT AND WITH MULTISTAGE HARDENING | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2002-05-02 | — | — | WO | disclosed |
| US-20010021750-A1 | Polymer compound, method of producing the same, photosensitive composition, and pattern formation method | TOYO GOSEI KOGYO CO., LTD. (JP) | 2001-09-13 | — | — | US | disclosed |
| EP-1117005-A1 | Polymer compound, method of producing the same, photosensitive composition, and pattern formation method | Toyo Gosei Kogyo Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-0635031-A1 | PROCESS FOR PRODUCING SURFACE-DISTRIBUTED, PRESSURE-SENSITIVE ADHESIVE MATERIALS BY RADICAL POLYMERISATION OF COMPOSITIONS CONTAINING ACRYLIC ACID AND/OR ACRYLIC ACID DERIVATES | Lohmann GmbH & Co. KG (DE) | 1995-01-25 | — | — | EP | disclosed |
| EP-0398713-B1 | Photosensitive resin composition and laminate using the same | HITACHI CHEMICAL CO LTD (JP) | 1994-07-20 | — | — | EP | disclosed |
| WO-1993020112-A1 | PROCESS FOR PRODUCING SURFACE-DISTRIBUTED, PRESSURE-SENSITIVE ADHESIVE MATERIALS BY RADICAL POLYMERISATION OF COMPOSITIONS CONTAINING ACRYLIC ACID AND/OR ACRYLIC ACID DERIVATES | LOHMANN GMBH & CO. KG (DE) | 1993-10-14 | — | — | WO | disclosed |
| US-4980266-A | Excellent stability and resistance to plating | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1990-12-25 | — | — | US | disclosed |
| EP-0398713-A2 | Photosensitive resin composition and laminate using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-11-22 | — | — | EP | disclosed |