SCHEMBL19985763

SCHEMBL19985763

O=C(O)C1CC2CC1CC2OC(O)c1cc(I)cc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19678504 0.75 — —
SCHEMBL19678509 0.69 POLB (0.32) —
SCHEMBL22403233 0.66 SCN9A (0.31) —
SCHEMBL11959531 0.64 — —
SCHEMBL19985768 0.62 GPR17 (0.33) —
SCHEMBL19684029 0.61 KMT2A (0.34) —
SCHEMBL24632265 0.61 KMT2A (0.49) —
SCHEMBL22656590 0.60 GABRR1 (0.50) —
SCHEMBL109579 0.60 GABRR1 (0.50) —
SCHEMBL27224128 0.60 GABRR1 (0.50) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180081267-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-22 — — US disclosed
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