SCHEMBL22403233

SCHEMBL22403233

CS(=O)(=O)NC(=O)C1CC2CC(OC(O)c3cc(I)cc(I)c3I)C1C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ SCN9A Q15858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097479 0.80 SCN9A (0.33) SCN9A
SCHEMBL22790007 0.76 ACACB (0.34) SCN9A
SCHEMBL19985763 0.66 — —
SCHEMBL22403232 0.64 SCN9A (0.30) SCN9A
SCHEMBL22403150 0.63 TTR (0.34) —
SCHEMBL22097570 0.63 PCNA (0.32) SCN9A
SCHEMBL25475714 0.62 — —
SCHEMBL22097561 0.60 PCNA (0.32) SCN9A
SCHEMBL19678486 0.60 — —
SCHEMBL25479340 0.59 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-11269253-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 — — US disclosed
US-20200285149-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 — — US disclosed
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