SCHEMBL19990803

SCHEMBL19990803

C=CCC(C=C)(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.52
ALDH1A1 P00352 3/20 0.52
HTT P42858 1/20 0.48
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
MAPT P10636 2/20 0.38
ATM Q13315 1/20 0.36
MAPK1 P28482 1/20 0.34
KCNN4 O15554 1/20 0.33
KDM4E B2RXH2 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
ACSS2 Q9NR19 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9717826 0.77 TSHR (0.42) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL1862170 0.76 TSHR (0.55) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL7740564 0.76 TSHR (0.55) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL5690296 0.76 TSHR (0.55) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL30434815 0.74 HTT (0.55) TSHRALDH1A1HTTKMT2AMEN1
Ammonia Solution, Strong SCHEMBL11170544 0.74 TSHR (0.53) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL601038 0.74 TSHR (0.53) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL8927952 0.74 ALDH1A1 (0.53) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL15644141 0.73 TSHR (0.52) TSHRALDH1A1HTTKMT2AMEN1
SCHEMBL21602929 0.73 TSHR (0.52) TSHRALDH1A1HTTKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250382459-A1 RESIN COMPOSITION AND ARTICLE MANUFACTURED USING THE SAME ELITE MATERIAL CO LTD (TW) 2025-12-18 US claimed
US-20250382459-A1 RESIN COMPOSITION AND ARTICLE MANUFACTURED USING THE SAME ELITE MATERIAL CO LTD (TW) 2025-12-18 US disclosed
CN-116621733-B Unsaturated monomer containing polyallylphenoxy and nitrile group structure, and preparation method and application thereof 山东星顺新材料有限公司 2024-03-08 CN disclosed
CN-116621733-A Unsaturated monomer containing polyallylphenoxy and nitrile group structure, and preparation method and application thereof 山东星顺新材料有限公司 2023-08-22 CN disclosed
CN-107868188-B Phosphorus-containing ethylene polyphenylene ether, resin composition containing the same, and product thereof 台光电子材料股份有限公司 2021-02-02 CN disclosed
US-10000599-B2 Phosphorus-containing vinyl polyphenylene ether, resin composition comprising phosphorus-containing vinyl polyphenylene ether and product thereof Elite Material Co., Ltd. (TW) 2018-06-19 US disclosed
CN-107868188-A Phosphorus-containing ethylene polyphenylene ether, resin composition containing the same, and product thereof 台光电子材料股份有限公司 2018-04-03 CN disclosed
US-20180086870-A1 PHOSPHORUS-CONTAINING VINYL POLYPHENYLENE ETHER, RESIN COMPOSITION COMPRISING PHOSPHORUS-CONTAINING VINYL POLYPHENYLENE ETHER AND PRODUCT THEREOF Elite Material Co., Ltd. (TW) 2018-03-29 US disclosed
CN-100523055-C Process for producing bisphenol A MITSUI CHEMICALS INC (JP) 2009-08-05 CN disclosed
CN-1849361-A Process for producing bisphenol a MITSUI CHEMICALS INC (JP) 2006-10-18 CN disclosed