⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19139223 | 1.00 | — | — | |
| SCHEMBL75351 | 0.82 | TSHR (0.30) | — | |
| SCHEMBL119800 | 0.78 | — | — | |
| SCHEMBL2117636 | 0.78 | ALDH1A1 (0.31) | — | |
| SCHEMBL74936 | 0.76 | — | — | |
| SCHEMBL12405464 | 0.76 | — | — | |
| SCHEMBL13425047 | 0.76 | — | — | |
| SCHEMBL12555698 | 0.76 | — | — | |
| SCHEMBL22402830 | 0.76 | — | — | |
| SCHEMBL4403858 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9910358-B2 | Patterning process and chemically amplified negative resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-06 | — | — | US | disclosed |