Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 4/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20024433 | 0.88 | HMGCR (0.30) | — | |
| SCHEMBL18326353 | 0.87 | SMN1; SMN2 (0.46) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL20024441 | 0.87 | ALDH1A1 (0.42) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL20024440 | 0.86 | ALDH1A1 (0.41) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL14566235 | 0.85 | ALDH1A1 (0.41) | ALDH1A1TP53CYP3A4MGLL | |
| SCHEMBL47407 | 0.82 | ALDH1A1 (0.49) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL13431263 | 0.79 | TSHR (0.53) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL20024446 | 0.76 | HMGCR (0.35) | ALDH1A1TSHRMAPK1TP53CYP3A4 | |
| SCHEMBL20024454 | 0.76 | HMGCR (0.32) | ALDH1A1 | |
| SCHEMBL13655650 | 0.76 | ALDH1A1 (0.38) | ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230236505-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM | SAN-APRO LTD. (JP) | 2023-07-27 | — | — | US | disclosed |
| US-20180095366-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-05 | — | — | US | disclosed |