SCHEMBL20024433

SCHEMBL20024433

CCC(C)(C)C(=O)OCCOCC(=O)OCCC1CO1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20024454 0.89 HMGCR (0.32) HMGCR
SCHEMBL20024451 0.88 ALDH1A1 (0.38)
SCHEMBL20024439 0.88 HMGCR (0.32) HMGCR
SCHEMBL20024446 0.87 HMGCR (0.35) HMGCR
SCHEMBL18326353 0.80 SMN1; SMN2 (0.46) HMGCR
SCHEMBL20024445 0.79 FKBP1A (0.39) HMGCR
SCHEMBL2607759 0.75 CES2 (0.31)
SCHEMBL20024441 0.75 ALDH1A1 (0.42)
SCHEMBL20024440 0.73 ALDH1A1 (0.41)
SCHEMBL25891687 0.73 POLB (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236505-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM SAN-APRO LTD. (JP) 2023-07-27 US disclosed
US-20180095366-A1 NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-05 US disclosed