SCHEMBL2003087

SCHEMBL2003087

C=C(C)C(=O)NC(COC(=O)C(=C)C)NC(=O)C(=C)C

nearest known ligand 0.57

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.57
TGFBR1 P36897 1/20 0.43
ALDH1A1 P00352 2/20 0.41
THRB P10828 1/20 0.40
POLB P06746 1/20 0.30
APEX1 P27695 1/20 0.30
HTT P42858 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28874573 0.86 TSHR (0.59) TSHRTGFBR1ALDH1A1THRBPOLB
SCHEMBL28847807 0.85 TSHR (0.57) TSHRTGFBR1ALDH1A1THRBPOLB
SCHEMBL22215984 0.85 TSHR (0.57) TSHRTGFBR1ALDH1A1THRBPOLB
SCHEMBL150581 0.80 TSHR (0.61) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL12803643 0.77 TSHR (0.62) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL2504502 0.77 TSHR (0.57) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL28461125 0.76 TSHR (0.47) TSHRTGFBR1ALDH1A1THRB
SCHEMBL147268 0.74 TSHR (0.71) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL13205121 0.74 TGFBR1 (0.52) TSHRTGFBR1ALDH1A1TDP1
SCHEMBL4983888 0.74 TSHR (0.58) TSHRTGFBR1ALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5780199-A A COPOLYAMIC ACID FROM TETRACARBOXYLIC ACID DIANHYDRIDE, ORGANIC DIAMINE, FLUORINATED DIAMINE, FLUORINATED TETRACARBOXYLIC ACID DIANHYDRIDE, A PHOTOINITIATOR AND SENSITIZER; EXPOSURE TO FORM IMAGES, PATTERNING, CROSSLINKING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-14 US claimed
EP-0538683-A1 Polyamic acid and polyimide from fluorinated reactant International Business Machines Corporation (US) 1993-04-28 EP claimed
US-8716413-B2 Photocurable composition HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2014-05-06 US disclosed
US-20110200950-A1 PHOTOCURABLE COMPOSITION HUNTSMAN INTERNATIONAL LLC (US) 2011-08-18 US disclosed
EP-2331599-A1 PHOTOCURABLE COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2011-06-15 EP disclosed
WO-2010034531-A1 PHOTOCURABLE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2010-04-01 WO disclosed
EP-2168994-A1 Photocurable composition Huntsman Advanced Materials (Switzerland) GmbH (CH) 2010-03-31 EP disclosed
EP-1651695-B1 PHOTOCROSSLINKABLE POLYURETHANES HUNTSMAN ADV MAT SWITZERLAND (CH) 2009-01-21 EP disclosed
US-7476484-B2 Photocrosslinkable polyurethanes HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2009-01-13 US disclosed
US-7387812-B2 Telechelic polymers; improved adhesion properties, chemical stability, electrical properties and resistance to rapid temperature ranges; for use as solder resists in production of circuit boards HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2008-06-17 US disclosed
EP-1468041-B1 RESIN COMPOSITION HUNTSMAN ADV MAT SWITZERLAND (CH) 2007-05-30 EP disclosed
EP-1468041-A1 RESIN COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2004-10-20 EP disclosed
EP-1458794-A1 HEAT-CURABLE RESIN COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2004-09-22 EP disclosed
WO-2003048234-A1 RESIN COMPOSITION VANTICO AG (CH) 2003-06-12 WO disclosed
WO-2003048235-A1 HEAT-CURABLE RESIN COMPOSITION VANTICO AG (CH) 2003-06-12 WO disclosed
US-6057902-A Pixels for wide viewing angle liquid crystal display INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2000-05-02 US disclosed
US-5780199-A A COPOLYAMIC ACID FROM TETRACARBOXYLIC ACID DIANHYDRIDE, ORGANIC DIAMINE, FLUORINATED DIAMINE, FLUORINATED TETRACARBOXYLIC ACID DIANHYDRIDE, A PHOTOINITIATOR AND SENSITIZER; EXPOSURE TO FORM IMAGES, PATTERNING, CROSSLINKING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-14 US disclosed
US-5464927-A Polyamic acid and polyimide from fluorinated reactant INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-11-07 US disclosed
US-5300403-A Line width control in a radiation sensitive polyimide INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-04-05 US disclosed
EP-0538683-A1 Polyamic acid and polyimide from fluorinated reactant International Business Machines Corporation (US) 1993-04-28 EP disclosed