⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1050420 | 0.97 | THRB (0.50) | — | |
| SCHEMBL8679435 | 0.97 | — | — | |
| SCHEMBL17766188 | 0.97 | THRB (0.50) | — | |
| SCHEMBL11612233 | 0.97 | THRB (0.50) | — | |
| SCHEMBL28493138 | 0.97 | — | — | |
| SCHEMBL1079513 | 0.90 | — | — | |
| SCHEMBL10725616 | 0.87 | — | — | |
| SCHEMBL27623453 | 0.87 | — | — | |
| 1-Hexanol SCHEMBL28505540 | 0.84 | LMNA (0.62) | — | |
| SCHEMBL27559152 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 346 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117884182-A | Catalyst system for trimerization and tetramerization of ethylene with little polymer formation, preparation method and application thereof | 天津科技大学 | 2024-04-16 | — | — | CN | claimed |
| CN-102516929-B | Low-hardness glue-dispensing shaping shielding conductive adhesive as well as preparation method and application thereof | SHANGHAI RELAND PHOTOVOLTAIC MATERIAL CO LTD | 2013-12-04 | — | — | CN | claimed |
| CN-102219188-B | Process for production of a borohydride compound | ROHM & HAAS | 2013-07-17 | — | — | CN | claimed |
| CN-102516929-A | Low-hardness glue-dispensing shaping shielding conductive adhesive as well as preparation method and application thereof | SHANGHAI RELAND PHOTOVOLTAIC MATERIAL CO LTD | 2012-06-27 | — | — | CN | claimed |
| CN-102219188-A | Process for production of a borohydride compound | ROHM & HAAS | 2011-10-19 | — | — | CN | claimed |
| CN-1121369-C | Preparation of higher unsaturated ketone | BASF AG (DE) | 2003-09-17 | — | — | CN | claimed |
| CN-1117724-C | Method for preparing unsaturated ketone | BASF AG (DE) | 2003-08-13 | — | — | CN | claimed |
| CN-1098864-C | Polymerization catalyst containing active free radical of Lewis acid and its use | UNIV HUADONG SCI & ENG (CN) | 2003-01-15 | — | — | CN | claimed |
| EP-0885656-B1 | Catalytic composition and ethylene oligomerization, especially in 1-butene and/or 1-hexene | INST FRANCAIS DU PETROLE (FR) | 2002-01-02 | — | — | EP | claimed |
| CN-1286247-A | Process for preparing prolycopene and its intermediate | SUMITOMO CHEMICAL CO (JP) | 2001-03-07 | — | — | CN | claimed |
| CN-1263884-A | Method for preparing unsaturated ketone | BASF AG (DE) | 2000-08-23 | — | — | CN | claimed |
| US-6031145-A | A CATALYTIC COMPOSITION MIXTURE COMPRISING ONE CHROMIUM COMPOUND, ONE ARYLOXY ALUMINUM COMPOUND AND ONE HYDROCARBYL ALUMINUM COMPOUND FOR DIMERIZATION, TRIMERIZATION | INSTITUT FRANCAIS DU PETROLE (FR) | 2000-02-29 | — | — | US | claimed |
| EP-0781783-B1 | Metallocene catalyst systems with sterically hindered Lewis-base | BASF AG (DE) | 1999-06-02 | — | — | EP | claimed |
| CN-1210868-A | Polymerization catalyst containing active free radical of Lewis acid and its use | UNIV HUADONG SCI & ENG (CN) | 1999-03-17 | — | — | CN | claimed |
| EP-0091131-B1 | PHOTO-CURABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1988-07-20 | — | — | EP | claimed |
| EP-0103305-B1 | PHOTO-CURABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-07-22 | — | — | EP | claimed |
| US-4495042-A | Photo-curable epoxy resin composition | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1985-01-22 | — | — | US | claimed |
| US-4479860-A | ORGANOALUMINUM COMPOUND AND PEROXYSILYL COMPOUND AS HARDENING CATALYST | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1984-10-30 | — | — | US | claimed |
| EP-0103305-A1 | Photo-curable epoxy resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1984-03-21 | — | — | EP | claimed |
| EP-0091131-A2 | Photo-curable epoxy resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1983-10-12 | — | — | EP | claimed |