⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9455023 | 0.73 | TDP1 (0.39) | — | |
| SCHEMBL6051822 | 0.73 | — | — | |
| SCHEMBL1539360 | 0.73 | TSHR (0.39) | — | |
| SCHEMBL124751 | 0.73 | TSHR (0.39) | — | |
| SCHEMBL55166 | 0.73 | — | — | |
| SCHEMBL28010691 | 0.73 | ACHE (0.47) | — | |
| Hydrochloric Acid SCHEMBL11803910 | 0.71 | TSHR (0.37) | — | |
| SCHEMBL14875991 | 0.71 | TSHR (0.37) | — | |
| SCHEMBL2799322 | 0.71 | TSHR (0.37) | — | |
| SCHEMBL2522935 | 0.71 | TSHR (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| CN-113292906-A | Preparation and application of high-hardness wear-resistant coating | 东莞市溢美材料科技有限公司 | 2021-08-24 | — | — | CN | claimed |
| US-5270151-A | Spin on oxygen reactive ion etch barrier | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-12-14 | — | — | US | claimed |
| CN-113292906-A | Preparation and application of high-hardness wear-resistant coating | 东莞市溢美材料科技有限公司 | 2021-08-24 | — | — | CN | disclosed |
| CN-109553777-B | Room-temperature curing agent of high-temperature-resistant organosilicon material, preparation method and application | 中国科学院化学研究所 | 2020-07-14 | — | — | CN | disclosed |
| CN-111253575-A | Preparation method and application of high-refractive-index phenyl methyl amino silicone resin | 东莞市溢美材料科技有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-111253575-A | Preparation method and application of high-refractive-index phenyl methyl amino silicone resin | 东莞市溢美材料科技有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-104250258-B | Aza-polysilane precursors and methods of depositing films comprising the same | 弗萨姆材料美国有限责任公司 | 2018-01-19 | — | — | CN | disclosed |
| US-20170282401-A1 | Casting Cores And Producing Slips | SIEMENS AKTIENGESELLSCHAFT (DE) | 2017-10-05 | — | — | US | disclosed |
| EP-3169640-A1 | PRODUCTION OF A SLIP AND COMPONENT COMPOSED OF THE SLIP | Siemens Aktiengesellschaft (DE) | 2017-05-24 | — | — | EP | disclosed |
| CN-104080944-B | Organosilane Precursors for ALD/CVD Silicon-Containing Thin Film Applications | 乔治洛德方法研究和开发液化空气有限公司 | 2016-08-24 | — | — | CN | disclosed |
| CN-102295657-B | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PROD & CHEM | 2015-04-29 | — | — | CN | disclosed |
| US-8431189-B2 | Carbon nanotube-nanofiber composite structure | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) | 2013-04-30 | — | — | US | disclosed |
| WO-2011078527-A1 | CARBON NANOTUBE-NANOFIBER COMPOSITE STRUCTURE | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) | 2011-06-30 | — | — | WO | disclosed |
| US-20110151736-A1 | CARBON NANOTUBE-NANOFIBER COMPOSITE STRUCTURE | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION (KR) | 2011-06-23 | — | — | US | disclosed |
| US-5270151-A | Spin on oxygen reactive ion etch barrier | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-12-14 | — | — | US | disclosed |
| US-5097055-A | PRODUCTION OF METHYLPHENYLTRISILOXANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1992-03-17 | — | — | US | disclosed |