SCHEMBL20073353

SCHEMBL20073353

CC(C)(COC(=O)C12CC3CC(CC(C3)C1)C2)S(=O)(=O)O

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 4/20 0.44
CYP19A1 P11511 4/20 0.44
ALDH1A1 P00352 7/20 0.44
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
NPSR1 Q6W5P4 2/20 0.44
MAPT P10636 2/20 0.44
PRKCA P17252 1/20 0.43
PKM P14618 1/20 0.42
ATM Q13315 1/20 0.41
KDM4E B2RXH2 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.38
SCN1A P35498 1/20 0.37
SCN2A Q99250 1/20 0.37
SCN3A Q9NY46 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15858407 0.85 ALDH1A1 (0.42) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL2610451 0.84 ALDH1A1 (0.44) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL1398391 0.83 ALDH1A1 (0.43) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL19606976 0.83 ALDH1A1 (0.45) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL17425997 0.82 ALDH1A1 (0.40) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL16731571 0.82 ALDH1A1 (0.50) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL15853229 0.81 ALDH1A1 (0.37) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL1262662 0.79 ALDH1A1 (0.38) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL19051103 0.79 CYP17A1 (0.43) CYP17A1CYP19A1ALDH1A1KMT2AMEN1
SCHEMBL15581659 0.79 ALDH1A1 (0.42) CYP17A1CYP19A1ALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180107118-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FUJIFILM CORPORATION (JP) 2018-04-19 US disclosed