SCHEMBL20096387

SCHEMBL20096387

CC(=O)O/N=C(\Cc1ccccc1)C(=O)c1ccc2c(c1)C(CCC(F)(F)F)(CCC(F)(F)F)c1ccccc1-2

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ PDK2 Q15119 19/20 0.38
▸ APEX1 P27695 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20090052 0.96 PDK2 (0.36) PDK2APEX1
SCHEMBL20096388 0.93 PDK2 (0.36) PDK2
SCHEMBL20090053 0.90 PDK2 (0.34) PDK2
SCHEMBL18123031 0.86 PDK2 (0.40) PDK2APEX1
SCHEMBL17086822 0.84 PDK2 (0.46) PDK2
SCHEMBL18123035 0.83 PDK2 (0.41) PDK2
SCHEMBL20090058 0.83 CTBP2 (0.39) PDK2APEX1
SCHEMBL18926235 0.83 PDK2 (0.38) PDK2APEX1
SCHEMBL20090054 0.82 PDK2 (0.33) PDK2
SCHEMBL17084340 0.81 PDK2 (0.43) PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10416560-B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition TOKYO OHKA KOGYO CO, LTD. (JP) 2019-09-17 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
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