SCHEMBL20090058

SCHEMBL20090058

CC(=O)O/N=C(\Cc1cccc(C)c1)C(=O)c1ccc2c(c1)C(CCc1ccccc1)(CCc1ccccc1)c1ccccc1-2

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CTBP2 P56545 1/20 0.39
▸ L3MBTL1 Q9Y468 4/20 0.38
▸ TDP1 Q9NUW8 3/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ KDM4E B2RXH2 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ MAPT P10636 1/20 0.34
▸ GRIN2B Q13224 1/20 0.34
▸ NPC1 O15118 1/20 0.33
▸ APEX1 P27695 1/20 0.33
▸ MAOB P27338 1/20 0.33
▸ GPR52 Q9Y2T5 1/20 0.32
▸ FFAR1 O14842 1/20 0.32
▸ FFAR4 Q5NUL3 1/20 0.32
▸ PDK2 Q15119 1/20 0.31
▸ CNR2 P34972 1/20 0.31
▸ BRS3 P32247 1/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20090059 0.91 CTBP2 (0.37) CTBP2L3MBTL1TDP1RAB9AALDH1A1
SCHEMBL20090055 0.91 CTBP2 (0.37) CTBP2L3MBTL1TDP1RAB9AALDH1A1
SCHEMBL20090056 0.90 CTBP2 (0.36) CTBP2L3MBTL1TDP1RAB9AALDH1A1
SCHEMBL20090057 0.89 PDK2 (0.37) CTBP2L3MBTL1TDP1RAB9AKDM4E
SCHEMBL20096388 0.89 PDK2 (0.36) CTBP2L3MBTL1MAOBPDK2
SCHEMBL20096531 0.89 CTBP2 (0.35) CTBP2L3MBTL1TDP1RAB9AMAOB
SCHEMBL20090053 0.86 PDK2 (0.34) CTBP2L3MBTL1TDP1PDK2
SCHEMBL20090060 0.86 L3MBTL1 (0.40) CTBP2L3MBTL1ALDH1A1MAPTNPC1
SCHEMBL20090054 0.83 PDK2 (0.33) CTBP2L3MBTL1PDK2
SCHEMBL20096387 0.83 PDK2 (0.38) APEX1PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10416560-B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition TOKYO OHKA KOGYO CO, LTD. (JP) 2019-09-17 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
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