SCHEMBL20097903

SCHEMBL20097903

CCC(S)(CC)c1cccc(OC)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.50
KIF11 P52732 1/20 0.46
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
ALDH1A1 P00352 1/20 0.44
CYP3A4 P08684 1/20 0.44
TAAR1 Q96RJ0 3/20 0.42
IDO1 P14902 2/20 0.42
AGXT P21549 2/20 0.42
MAOB P27338 2/20 0.41
CES2 O00748 1/20 0.40
CES1 P23141 1/20 0.40
ENPP2 Q13822 1/20 0.40
LMNA P02545 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM1 P11229 1/20 0.40
CHRM3 P20309 1/20 0.40
CHRM5 P08912 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18574318 0.85 KIF11 (0.44) ACHEKIF11CA1CA2CA7
SCHEMBL8210845 0.84 KIF11 (0.49) ACHEKIF11CA1CA2CA7
SCHEMBL3435840 0.81 KIF11 (0.46) ACHEKIF11CA1CA2CA7
SCHEMBL13930875 0.81 KIF11 (0.46) ACHEKIF11CA1CA2CA7
SCHEMBL18403077 0.80 ACHE (0.48) ACHEKIF11CA1CA2CA7
SCHEMBL3079892 0.79 KIF11 (0.45) ACHEKIF11CA1CA2CA7
SCHEMBL7125526 0.79 KIF11 (0.45) ACHEKIF11CA1CA2CA7
SCHEMBL13815894 0.78 KIF11 (0.44) ACHEKIF11CA1CA2CA7
SCHEMBL10064795 0.78 KIF11 (0.44) ACHEKIF11CA1CA2CA7
SCHEMBL4856152 0.77 KIF11 (0.50) ACHEKIF11CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9958775-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask FUJIFILM CORPORATION (JP) 2018-05-01 US disclosed