SCHEMBL20102175

SCHEMBL20102175

C=CC(=O)OC1CCc2ccccc21

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 4/20 0.51
HTR2C P28335 1/20 0.41
OPRM1 P35372 1/20 0.41
DRD3 P35462 1/20 0.41
AVPR1A P37288 1/20 0.41
OPRK1 P41145 1/20 0.41
CHRM4 P08173 2/20 0.41
DRD2 P14416 2/20 0.41
HTR7 P34969 2/20 0.41
PIN1 Q13526 2/20 0.40
ALDH1A1 P00352 2/20 0.40
LMNA P02545 1/20 0.40
KMT2A Q03164 1/20 0.40
HTR1A P08908 2/20 0.40
FFAR1 O14842 3/20 0.39
CTSV O60911 1/20 0.39
CTSL P07711 1/20 0.39
CTSS P25774 1/20 0.39
CTSK P43235 1/20 0.39
TAS1R3 Q7RTX0 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31564967 1.00 IDO1 (0.51) IDO1HTR2COPRM1DRD3AVPR1A
SCHEMBL11548232 0.91 IDO1 (0.54) IDO1CHRM4DRD2HTR7ALDH1A1
SCHEMBL29733370 0.91 IDO1 (0.54) IDO1CHRM4DRD2HTR7ALDH1A1
SCHEMBL11142136 0.82 IDO1 (0.59) IDO1HTR2COPRM1DRD3AVPR1A
SCHEMBL29590253 0.82 IDO1 (0.59) IDO1HTR2COPRM1DRD3AVPR1A
SCHEMBL14297434 0.81 ALDH1A1 (0.60) ALDH1A1KDM4EMAPTTSHRHSD17B10
SCHEMBL8308445 0.80 IDO1 (0.58) IDO1HTR2COPRM1DRD3AVPR1A
SCHEMBL27485547 0.80 SRD5A1 (0.41) CHRM4DRD2HTR7
SCHEMBL27442086 0.79 IDO1 (0.53) IDO1HTR2COPRM1DRD3AVPR1A
SCHEMBL30908530 0.79 IDO1 (0.56) IDO1HTR2COPRM1DRD3AVPR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed