SCHEMBL20102181

SCHEMBL20102181

CCc1cc(C2(c3cc(C)c(O)c(CC)c3)CCCCC2)cc(C)c1O

nearest known ligand 0.71

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.71
ESR1 P03372 4/20 0.51
ESR2 Q92731 4/20 0.51
PPARA Q07869 1/20 0.43
ALOX12 P18054 4/20 0.42
LMNA P02545 3/20 0.42
NPSR1 Q6W5P4 1/20 0.42
ALDH1A1 P00352 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
GLA P06280 1/20 0.33
TSHR P16473 1/20 0.33
CYP1A2 P05177 2/20 0.33
CYP2C9 P11712 2/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
MAOA P21397 1/20 0.33
SHBG P04278 1/20 0.33
CNR2 P34972 2/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8678311 0.90 ACHE (0.58) ACHEESR1ESR2PPARAALOX12
SCHEMBL8097450 0.90 ACHE (0.58) ACHEESR1ESR2PPARAALOX12
SCHEMBL6890947 0.87 ACHE (0.67) ACHEESR1ESR2PPARAALOX12
SCHEMBL8346849 0.87 ACHE (0.71) ACHEESR1ESR2PPARAALOX12
SCHEMBL20225253 0.87 ACHE (0.71) ACHEESR1ESR2PPARAALOX12
SCHEMBL18101022 0.84 ACHE (0.67) ACHEESR1ESR2PPARAALOX12
SCHEMBL20110099 0.84 ACHE (0.67) ACHEESR1ESR2PPARAALOX12
SCHEMBL675004 0.84 ACHE (1.00) ACHEESR1ESR2PPARAALOX12
SCHEMBL10941758 0.84 ACHE (1.00) ACHEESR1ESR2PPARAALOX12
SCHEMBL673355 0.84 ACHE (1.00) ACHEESR1ESR2PPARAALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed