SCHEMBL20127103

SCHEMBL20127103

CN[SiH2]O[SiH2]O[SiH2]NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20127098 0.84
SCHEMBL28433255 0.64
SCHEMBL1397136 0.61
SCHEMBL20127082 0.57
Dimethylamine SCHEMBL165295 0.50
SCHEMBL2104153 0.49
SCHEMBL432563 0.49
SCHEMBL2100861 0.46
Dimethylamine SCHEMBL29100251 0.45
Dimethylamine SCHEMBL27604350 0.45

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2018-05-10 US disclosed