SCHEMBL432563

SCHEMBL432563

CN[SiH2]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15355988 0.69
Dimethylamine SCHEMBL2503496 0.67
Dimethylamine SCHEMBL10624973 0.67
SCHEMBL2104153 0.62
Dimethylamine SCHEMBL3978349 0.62
SCHEMBL2100861 0.59
SCHEMBL9175915 0.59
SCHEMBL17046120 0.59
SCHEMBL703656 0.58
SCHEMBL22207749 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108348489-A SHISHIJIMICIN A's and the like is fully synthetic 威廉马歇莱思大学 2018-07-31 CN claimed
US-8378489-B2 Semiconductor device and manufacturing method therefor FUJITSU LIMITED (JP) 2013-02-19 US claimed
US-20230374226-A1 POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICEOUS FILM USING THE SAME MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) 2023-11-23 US disclosed
US-20230312978-A1 POLYSILAZANE, SILICEOUS FILM-FORMING COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICEOUS FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-10-05 US disclosed
US-20230227662-A1 COATING MATERIAL AND COATING METHOD HARDOLASS HOLDINGS CO., LTD. (JP) 2023-07-20 US disclosed
US-20180201807-A1 COMPOSITION AND METHOD OF PRODUCING SILICEOUS FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-19 US disclosed
CN-108137587-A Method for producing (4S) -4- (4-cyano-2-methoxyphenyl) -5-ethoxy-2, 8-dimethyl-1, 4-dihydro-1, 6-naphthyridine-3-carboxamide by means of electrochemical methods and for recovering (4S) -4- (4-cyano-2-methoxyphenyl) -5-ethoxy-2, 8-dimethyl-1, 4-dihydro-1, 6-naphthyridine-3-carboxamide 拜耳制药股份公司 2018-06-08 CN disclosed
CN-108059589-A Novel compounds for the treatment of diabetes 香港中文大学 2018-05-22 CN disclosed
US-20180051138-A1 CONDENSATION-CURABLE SILICONE RESIN COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-22 US disclosed
US-9896764-B2 Method for producing siliceous film and polysilazane coating treatment liquid used therefor MERCK PATENT GMBH (DE) 2018-02-20 US disclosed
EP-2640572-B1 METHOD OF REDUCING ELECTROMIGRATION OF SILVER AND ARTICLE MADE THEREBY 3M INNOVATIVE PROPERTIES CO (US) 2017-11-22 EP disclosed
US-20070274814-A1 Local clean robot-transport plant and robot-transport manufacturing method KABUSHIKI KAISHA TOSHIBA (JP) 2007-11-29 US disclosed
CN-100338061-C Alkyne-aryl phosphodiesterase-4 inhibitors MERCK FROSST CANADA INC (CA) 2007-09-19 CN disclosed
US-20070196672-A1 Perhydropolysilazane-containing coatings for metal and polymer surfaces BRAND STEFAN 2007-08-23 US disclosed
US-20070190308-A1 Coating for metal surfaces, method for the production thereof and use thereof as a self-cleaning protective layer, particularly for the rims of automobiles CLARIANT FINANCE (BVI) LIMITED (VG) 2007-08-16 US disclosed
CN-1960721-A C7 lactyloxy-substituted taxanes UNIV FLORIDA STATE RES FOUND (US) 2007-05-09 CN disclosed
US-20070047090-A1 Microlens substrate, a method for manufacturing the microlens substrate, a liquid crystal panel, and a projection type display apparatus SEIKO EPSON CORPORATION 2007-03-01 US disclosed
CN-1780889-A Curable coating compositions. HENKEL CORP (US) 2006-05-31 CN disclosed
CN-1706806-A Bistropylidenediamines and use thereof RANAIKCHES DEUTSCHE GMBH (DE) 2005-12-14 CN disclosed
CN-1639161-A Alkyne-aryl phosphodiesterase-4 inhibitors MERCK FROSST CANADA INC (CA) 2005-07-13 CN disclosed