⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20130859 | 0.89 | — | — | |
| SCHEMBL20130820 | 0.86 | — | — | |
| SCHEMBL20130862 | 0.82 | — | — | |
| SCHEMBL30173264 | 0.79 | DNM1 (0.32) | — | |
| SCHEMBL25281492 | 0.76 | — | — | |
| SCHEMBL20130847 | 0.76 | — | — | |
| SCHEMBL10514283 | 0.74 | — | — | |
| SCHEMBL8913461 | 0.74 | — | — | |
| SCHEMBL20130849 | 0.73 | — | — | |
| SCHEMBL3310539 | 0.71 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024254272-A1 | METHODS TO PROVIDE VOID FREE TRENCH FILL FOR LOGIC AND MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2024-12-12 | — | — | WO | disclosed |
| EP-4367709-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | Lam Research Corporation (US) | 2024-05-15 | — | — | EP | disclosed |
| WO-2023283144-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2023-01-12 | — | — | WO | disclosed |
| US-10703915-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2020-07-07 | — | — | US | disclosed |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-02-06 | — | — | US | disclosed |
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2018-05-10 | — | — | US | disclosed |