SCHEMBL20164929

SCHEMBL20164929

CC(=O)COC(=O)CCN(CCO)CCO.COC(=O)COC(=O)CCN(CCOC(C)=O)CCOC(C)=O

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
MGAM O43451 1/20 0.30
GAA P10253 1/20 0.30
SI P14410 1/20 0.30
MGAM2 Q2M2H8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64225 0.90 MEN1 (0.43) MEN1KMT2AMGAMGAASI
SCHEMBL65169 0.87 ALDH1A1 (0.36) MEN1KMT2AGAA
SCHEMBL64000 0.85 MEN1 (0.47) MEN1KMT2AMGAMGAASI
SCHEMBL64241 0.84 MEN1 (0.35) MEN1KMT2A
SCHEMBL63503 0.81 KMT2A (0.48) MEN1KMT2AMGAMGAASI
SCHEMBL65566 0.81 KMT2A (0.48) MEN1KMT2AMGAMGAASI
SCHEMBL4014737 0.80 GALR3 (0.33) MEN1KMT2AGAA
SCHEMBL13186140 0.79 ALDH1A1 (0.39) MEN1KMT2AGAA
SCHEMBL14182333 0.78 MEN1 (0.43) MEN1KMT2AMGAMGAASI
SCHEMBL14182297 0.78 MEN1 (0.43) MEN1KMT2AMGAMGAASI

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11693318-B2 Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-20180143535-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed