SCHEMBL4014737

SCHEMBL4014737

COCCOC(=O)CCN(CCO)CCO.COCCOC(=O)CCN(CCOC(C)=O)CCOC(C)=O

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GALR3 O60755 2/20 0.33
CHRM5 P08912 2/20 0.33
CHRM1 P11229 2/20 0.33
CHRM3 P20309 2/20 0.33
ALDH1A1 P00352 2/20 0.33
DNM1 Q05193 1/20 0.33
PGR P06401 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
HTR1A P08908 1/20 0.33
CHRNB2 P17787 1/20 0.33
TBXA2R P21731 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CHRNA10 Q9GZZ6 1/20 0.33
CHRNA9 Q9UGM1 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64038 0.94 ALDH1A1 (0.37) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL14182331 0.94 ALDH1A1 (0.37) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL64302 0.91 MEN1 (0.38) ALDH1A1DNM1CHRNB2CHRNB4CHRNA3
SCHEMBL13186140 0.91 ALDH1A1 (0.39) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL14182296 0.89 ALDH1A1 (0.42) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL14182354 0.89 CHRM5 (0.38) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL14182326 0.89 CHRM5 (0.38) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL64335 0.87 ALDH1A1 (0.42) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL14182332 0.87 ALDH1A1 (0.42) GALR3CHRM5CHRM1CHRM3ALDH1A1
SCHEMBL12258850 0.86 MEN1 (0.35) ALDH1A1DNM1SMN1; SMN2TSHRCDYL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1652844-B1 Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process SHINETSU CHEMICAL CO (JP) 2009-07-01 EP disclosed