SCHEMBL20170386

SCHEMBL20170386

COC(C)OC(=O)CCC(C)C1CCC2C3CCC4CC(O)CCC4(C)C3CCC12C

nearest known ligand 0.82

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPBAR1 Q8TDU6 5/20 0.82
▸ VDR P11473 4/20 0.82
▸ HIF1A Q16665 3/20 0.82
▸ CYP2C9 P11712 2/20 0.82
▸ EPHA2 P29317 4/20 0.73
▸ CASP7 P55210 3/20 0.73
▸ MAPK1 P28482 3/20 0.73
▸ USP2 O75604 3/20 0.73
▸ MAPT P10636 3/20 0.73
▸ TP53 P04637 2/20 0.73
▸ HSD17B10 Q99714 2/20 0.73
▸ BLM P54132 2/20 0.73
▸ TDP1 Q9NUW8 2/20 0.73
▸ CYP3A4 P08684 2/20 0.73
▸ LMNA P02545 2/20 0.73
▸ MDM4 O15151 1/20 0.73
▸ HSPD1 P10809 1/20 0.73
▸ TSHR P16473 1/20 0.73
▸ PTPN2 P17706 1/20 0.73
▸ PTPN1 P18031 1/20 0.73

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14549130 0.91 GPBAR1 (0.77) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL14491210 0.91 GPBAR1 (0.77) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21283622 0.91 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21273322 0.91 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21283621 0.91 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL12019714 0.91 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL14564608 0.91 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL2618668 0.91 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL23776966 0.90 GPBAR1 (1.00) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL1688648 0.90 GPBAR1 (1.00) GPBAR1VDRHIF1ACYP2C9EPHA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1621927-B1 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same FUJIFILM CORP (JP) 2018-05-23 — — EP disclosed
EP-1566693-B1 Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition FUJIFILM CORP (JP) 2018-05-23 — — EP disclosed
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