Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 5/20 | 0.76 |
| ▸ | VDR | P11473 | 4/20 | 0.76 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.76 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.76 |
| ▸ | EPHA2 | P29317 | 6/20 | 0.71 |
| ▸ | CASP7 | P55210 | 3/20 | 0.71 |
| ▸ | TP53 | P04637 | 2/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.71 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.71 |
| ▸ | BLM | P54132 | 2/20 | 0.71 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.71 |
| ▸ | USP2 | O75604 | 2/20 | 0.71 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.71 |
| ▸ | MDM4 | O15151 | 1/20 | 0.71 |
| ▸ | MAPT | P10636 | 1/20 | 0.71 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.71 |
| ▸ | TSHR | P16473 | 1/20 | 0.71 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.71 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.71 |
| ▸ | BRCA1 | P38398 | 1/20 | 0.71 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12019714 | 1.00 | GPBAR1 (0.76) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL14564608 | 1.00 | GPBAR1 (0.76) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL20804434 | 0.94 | GPBAR1 (0.67) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL20170386 | 0.91 | GPBAR1 (0.82) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL14549130 | 0.90 | GPBAR1 (0.77) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL14491210 | 0.90 | GPBAR1 (0.77) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL21273322 | 0.89 | GPBAR1 (0.83) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL21283622 | 0.89 | GPBAR1 (0.83) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL21283621 | 0.89 | GPBAR1 (0.83) | GPBAR1VDRHIF1ACYP2C9EPHA2 | |
| SCHEMBL12453267 | 0.89 | MAPT (0.77) | GPBAR1VDRHIF1ACYP2C9CASP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 497 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2550562-B1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORP (JP) | 2021-04-21 | — | — | EP | disclosed |
| EP-2539769-B1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORP (JP) | 2021-04-07 | — | — | EP | disclosed |
| US-10802399-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2020-10-13 | — | — | US | disclosed |
| US-10761424-B2 | — | — | 2020-09-01 | — | — | US | disclosed |
| US-10649329-B2 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2020-05-12 | — | — | US | disclosed |
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| EP-2434343-B1 | Resist composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORP (JP) | 2019-05-15 | — | — | EP | disclosed |
| EP-2470958-B1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10234759-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | FUJIFILM CORPORATION (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-1566693-B1 | Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10234759-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | AFF1, MACF1, RER1 | GPBAR1 1639/4885VDR 2545/4885HIF1A 2706/4885 |
| US-10761424-B2 | — | GLRA1, RER1, ACTR5 | GPBAR1 116/4885VDR 4229/4885HIF1A 1002/4885 |
| US-10802399-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, ACTR5, GLRA1 | GPBAR1 213/4885VDR 4174/4885HIF1A 1444/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.