SCHEMBL12019714

SCHEMBL12019714

CCOC(C)OC(=O)CC[C@@H](C)C1CCC2C3CCC4CC(O)CCC4(C)C3CCC21C

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPBAR1 Q8TDU6 5/20 0.76
▸ VDR P11473 4/20 0.76
▸ HIF1A Q16665 3/20 0.76
▸ CYP2C9 P11712 2/20 0.76
▸ EPHA2 P29317 6/20 0.71
▸ CASP7 P55210 3/20 0.71
▸ TP53 P04637 2/20 0.71
▸ MAPK1 P28482 2/20 0.71
▸ HSD17B10 Q99714 2/20 0.71
▸ BLM P54132 2/20 0.71
▸ TDP1 Q9NUW8 2/20 0.71
▸ USP2 O75604 2/20 0.71
▸ CYP3A4 P08684 2/20 0.71
▸ MDM4 O15151 1/20 0.71
▸ MAPT P10636 1/20 0.71
▸ HSPD1 P10809 1/20 0.71
▸ TSHR P16473 1/20 0.71
▸ PTPN2 P17706 1/20 0.71
▸ PTPN1 P18031 1/20 0.71
▸ BRCA1 P38398 1/20 0.71

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14564608 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL2618668 1.00 GPBAR1 (0.76) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL20804434 0.94 GPBAR1 (0.67) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL20170386 0.91 GPBAR1 (0.82) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL14549130 0.90 GPBAR1 (0.77) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL14491210 0.90 GPBAR1 (0.77) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21273322 0.89 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21283622 0.89 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL21283621 0.89 GPBAR1 (0.83) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL12453267 0.89 MAPT (0.77) GPBAR1VDRHIF1ACYP2C9CASP7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120219758-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-30 — — US disclosed
EP-2034361-A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition Fujifilm Corporation (JP) 2009-03-11 — — EP disclosed
EP-1748318-A2 Chemical amplification-type resist composition and production process thereof Fuji Photo Film Co., Ltd. (JP) 2007-01-31 — — EP disclosed
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