SCHEMBL201709

SCHEMBL201709

Nc1cccc(C(c2ccc(C(c3cccc(N)c3)(C(F)(F)F)C(F)(F)F)cc2)(C(F)(F)F)C(F)(F)F)c1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.63
MAPK1 P28482 1/20 0.63
ESR1 P03372 1/20 0.45
ESR2 Q92731 1/20 0.45
CYP3A4 P08684 1/20 0.44
CASP1 P29466 1/20 0.44
RECQL P46063 1/20 0.44
PTGS1 P23219 3/20 0.39
ALDH1A1 P00352 2/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CA14 Q9ULX7 1/20 0.37
MRGPRX4 Q96LA9 1/20 0.36
MAOA P21397 1/20 0.35
KIF11 P52732 2/20 0.34
LMNA P02545 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29492482 1.00 TSHR (0.63) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL7637720 0.96 TSHR (0.59) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL205041 0.96 TSHR (0.59) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL10493904 0.96 TSHR (0.68) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL126398 0.96 TSHR (0.68) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL29373758 0.96 TSHR (0.68) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL29799449 0.96 TSHR (0.68) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL8582903 0.94 TSHR (0.61) TSHRMAPK1ESR1ESR2CYP3A4
Hydrochloric Acid SCHEMBL8646815 0.94 TSHR (0.65) TSHRMAPK1ESR1ESR2CYP3A4
SCHEMBL203354 0.94 TSHR (0.65) TSHRMAPK1ESR1ESR2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2980058-B1 COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND TOKYO OHKA KOGYO CO LTD (JP) 2023-05-03 EP disclosed
US-20230101181-A1 CURABLE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, RESIST PATTERN, METHOD OF PRODUCING RESIST PATTERN, SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2023-03-30 US disclosed
US-11566108-B2 Polyimide film, laminate and surface material for display DAI NIPPON PRINTING CO., LTD. (JP) 2023-01-31 US disclosed
US-20220411584-A1 Transparent Polyimide Film and Production Method Therefor KANEKA CORPORATION (JP) 2022-12-29 US disclosed
US-11198280-B2 Medical film and method for producing same, medical coating composition, medical device and method for producing same MITSUI CHEMICALS, INC. (JP) 2021-12-14 US disclosed
US-11018341-B2 Binder composition for secondary battery NEC CORPORATION (JP) 2021-05-25 US disclosed
US-20210101862-A1 DIAMINE COMPOUND, METHOD OF PREPARING DIAMINE COMPOUND, AND POLYIMIDE ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2021-04-08 US disclosed
US-10935700-B2 Optical film and image display device DAI NIPPON PRINTING CO., LTD. (JP) 2021-03-02 US disclosed
US-20200386917-A1 OPTICAL FILM AND IMAGE DISPLAY DEVICE DAI NIPPON PRINTING CO., LTD. (JP) 2020-12-10 US disclosed
US-10813221-B2 Flexible wiring circuit board, producing method thereof, and imaging device NITTO DENKO CORPORATION (JP) 2020-10-20 US disclosed
EP-1237015-A1 OPTICAL MEMBERS MADE OF POLYIMIDE RESINS Mitsui Chemicals, Inc. (JP) 2002-09-04 EP disclosed
EP-1225192-A1 POLYIMIDES AND POLYAMIC ACIDS Mitsui Chemicals, Inc. (JP) 2002-07-24 EP disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
EP-1148078-A1 POLYIMIDE CONTAINING CROSSLINKABLE GROUP AND PROCESS FOR PRODUCING THE SAME Mitsui Chemicals, Inc. (JP) 2001-10-24 EP disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
EP-1090945-A1 CRYSTALLINE POLYIMIDE FOR MELT MOLDING WITH SATISFACTORY THERMAL STABILITY Mitsui Chemicals, Inc. (JP) 2001-04-11 EP disclosed
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 US disclosed
US-6159654-A Negative photosensitive polymer composition of a thermosetting polymer precursor curable by cyclodehydration upon heating KABUSHIKI KAISHA TOSHIBA (JP) 2000-12-12 US disclosed
US-6001517-A A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT KABUSHIKI KAISHA TOSHIBA (JP) 1999-12-14 US disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210101862-A1 DIAMINE COMPOUND, METHOD OF PREPARING DIAMINE COMPOUND, AND POLYIMIDE PARP2, RFC2, PARP12 TSHR 2270/4885MAPK1 2747/4885ESR1 2868/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.