SCHEMBL20175884

SCHEMBL20175884

CCOCC[N+](C)(CC)CC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
CHRM1 P11229 4/20 0.35
CHRM4 P08173 3/20 0.35
CHRM3 P20309 3/20 0.35
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CHRNA7 P36544 1/20 0.34
BBOX1 O75936 1/20 0.33
CHRM2 P08172 3/20 0.33
TSHR P16473 1/20 0.32
SCN1A P35498 2/20 0.31
SCN2A Q99250 2/20 0.31
SCN3A Q9NY46 2/20 0.31
CYP2D6 P10635 2/20 0.30
CHRM5 P08912 1/20 0.30
SIGMAR1 Q99720 1/20 0.30
LMNA P02545 1/20 0.30
CYP1A2 P05177 1/20 0.30
KMT2A Q03164 1/20 0.30
KCNH2 Q12809 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10452395 0.88 CHRM1 (0.37) CHRM1CHRM4CHRM3CHRNB4CHRNA3
SCHEMBL16674081 0.86 CHRM1 (0.36) CHRM1CHRM4CHRM3CHRNB4CHRNA3
Iodide SCHEMBL30354174 0.83 CHRNB4 (0.38) CHRM1CHRM4CHRM3CHRNB4CHRNA3
Propionic Acid SCHEMBL145939 0.83 BBOX1 (0.50) ALDH1A1CHRM1CHRM4CHRM3BBOX1
Butyric Acid SCHEMBL143249 0.79 BBOX1 (0.55) ALDH1A1CHRM1CHRM4CHRM3BBOX1
SCHEMBL202691 0.78 DNM1 (0.40) ALDH1A1CHRNB4CHRNA3CHRNA7BBOX1
SCHEMBL10257089 0.77 TSHR (0.48) ALDH1A1CHRM1CHRM4CHRM3CHRNB4
SCHEMBL15908308 0.77 BCHE (0.33) CHRM1CHRM4CHRM3CHRNB4CHRNA3
SCHEMBL15908311 0.77 BCHE (0.33) CHRM1CHRM4CHRM3CHRNB4CHRNA3
SCHEMBL1277086 0.77 BCHE (0.33) CHRM1CHRM4CHRM3CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3750849-A1 ALKALI METAL SALT OF FLUOROSULFONYL IMIDE, AND PRODUCTION METHOD THEREFOR Nippon Shokubai Co., Ltd. (JP) 2020-12-16 EP disclosed
US-10698314-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-30 US disclosed
US-20180143532-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed
US-20180143532-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed