Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28465660 | 1.00 | SLC22A1 (0.50) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| Water SCHEMBL25183773 | 0.95 | SLC22A1 (0.53) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| SCHEMBL28465064 | 0.94 | SLC22A1 (0.50) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| Hydrochloric Acid SCHEMBL8694682 | 0.92 | SLC22A1 (0.47) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| SCHEMBL10002130 | 0.92 | SLC22A1 (0.47) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| SCHEMBL1686254 | 0.91 | TSHR (0.47) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| SCHEMBL20175886 | 0.90 | SLC22A1 (0.50) | SLC22A1DNM1 | |
| Water SCHEMBL28477638 | 0.89 | SLC22A1 (0.53) | SLC22A1TSHRNFKB1KCNA1DNM1 | |
| SCHEMBL14839961 | 0.88 | SLC22A1 (0.67) | SLC22A1TSHRDNM1MEN1LMNA | |
| Water SCHEMBL2032857 | 0.88 | TSHR (0.44) | SLC22A1TSHRNFKB1KCNA1DNM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180143532-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-24 | — | — | US | disclosed |