Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.44 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1686254 | 0.97 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL3304873 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Hydrochloric Acid SCHEMBL853896 | 0.93 | KDM4E (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Bromide SCHEMBL14890342 | 0.93 | MEN1 (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL319959 | 0.93 | TSHR (0.44) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL476985 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL1686196 | 0.90 | TSHR (0.47) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| Water SCHEMBL25183773 | 0.89 | SLC22A1 (0.53) | TSHRNFKB1KCNA1LMNADNM1 | |
| SCHEMBL20175892 | 0.88 | SLC22A1 (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 | |
| SCHEMBL28465660 | 0.88 | SLC22A1 (0.50) | TSHRNFKB1KCNA1KDM4EPMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250154410-A1 | COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND ETCHING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-05-15 | — | — | US | disclosed |
| WO-2025063222-A1 | COMPOSITION AND KIT, AND METHOD FOR REMOVING RESIST AND METHOD FOR MANUFACTURING ELECTRONIC SUBSTRATE EACH USING THESE | 三菱瓦斯化学株式会社 | 2025-03-27 | — | — | WO | disclosed |
| EP-4485506-A1 | COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND ETCHING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-01-01 | — | — | EP | disclosed |
| CN-118715596-A | Composition, and method for manufacturing and etching semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2024-09-27 | — | — | CN | disclosed |
| WO-2024171908-A1 | SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD | 東京エレクトロン株式会社 | 2024-08-22 | — | — | WO | disclosed |
| CN-118369621-A | Method for stripping resin mask | 花王株式会社 | 2024-07-19 | — | — | CN | disclosed |
| CN-111566567-B | Cleaning agent composition for stripping resin mask | 花王株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118202306-A | Method for producing printed wiring board, method for stripping resist, and resist stripping pretreatment liquid used for the methods | 三菱瓦斯化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024085016-A1 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE | 東京エレクトロン株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-20240018020-A1 | PURIFICATION METHOD AND PURIFICATION APPARATUS FOR LIQUID TO BE PROCESSED CONTAINING TETRAALKYLAMMONIUM IONS | ORGANO CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-0328020-A2 | Use of a catalyst in epoxy compositions | THE DOW CHEMICAL COMPANY (US) | 1989-08-16 | — | — | EP | disclosed |
| EP-0099071-B1 | PROCESS FOR THE PREPARATION OF MONOBENZOYLATED 1,4-DIAMINOANTHRAQUINONES | BAYER AG (DE) | 1988-06-29 | — | — | EP | disclosed |
| US-4725652-A | TETRASUBSTITUTED ONIUM COMPOUNDS | THE DOW CHEMICAL COMPANY (US) | 1988-02-16 | — | — | US | disclosed |
| US-4589997-A | Process for preparing colloidal solution of antimony pentoxide | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1986-05-20 | — | — | US | disclosed |
| EP-0134708-A2 | Process for preparing colloidal solution of antimony pentoxide | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1985-03-20 | — | — | EP | disclosed |
| EP-0099071-A2 | Process for the preparation of monobenzoylated 1,4-diaminoanthraquinones | BAYER AG (DE) | 1984-01-25 | — | — | EP | disclosed |
| EP-0025926-B1 | PROCESS FOR THE PREPARATION OF MONOAROYLATED 1,4-DIAMINO ANTHRAQUINONES | BAYER AG (DE) | 1982-11-24 | — | — | EP | disclosed |
| US-4324732-A | IN PRESENCE OF TERITIARY ALIPHATIC AMINOALCOHOL AND/OR QUARTERNARY AMMONIUM COMPOUND | BAYER AKTIENGESELLSCHAFT (DE) | 1982-04-13 | — | — | US | disclosed |
| EP-0025926-A1 | Process for the preparation of monoaroylated 1,4-diamino anthraquinones | BAYER AG (DE) | 1981-04-01 | — | — | EP | disclosed |
| US-4078029-A | COATING, SANDING, DRYING, CALCINING, TRI- OR TETRA- ETHANOL AMMONIUM SILICATE, SILICA SOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JA) | 1978-03-07 | — | — | US | disclosed |