SCHEMBL2017635

SCHEMBL2017635

CC(C)=C(C)C(=O)OCCOCCOCCOCCO

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
THRB P10828 2/20 0.42
TSHR P16473 6/20 0.42
MAPK1 P28482 1/20 0.42
ALDH1A1 P00352 4/20 0.39
HTT P42858 1/20 0.38
MAPT P10636 1/20 0.38
TP53 P04637 2/20 0.34
HIF1A Q16665 2/20 0.34
HSD17B10 Q99714 1/20 0.34
CHRM5 P08912 2/20 0.33
CHRM1 P11229 2/20 0.33
CHRM3 P20309 2/20 0.33
EPHX2 P34913 1/20 0.32
GALR3 O60755 1/20 0.31
PGR P06401 1/20 0.30
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
HTR1A P08908 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11327718 1.00 MEN1 (0.46) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL976432 1.00 MEN1 (0.46) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL958243 0.87 TSHR (0.39) THRBTSHRALDH1A1MAPTHSD17B10
Ethylene Glycol SCHEMBL1008646 0.87 THRB (0.39) THRBTSHRALDH1A1MAPTHSD17B10
SCHEMBL1412813 0.84 MEN1 (0.42) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL1412646 0.84 MEN1 (0.42) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL1412762 0.84 MEN1 (0.42) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL859851 0.83 THRB (0.42) KMT2ATHRBTSHRALDH1A1MAPT
SCHEMBL28016301 0.82 MEN1 (0.61) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL14155821 0.82 MEN1 (0.61) MEN1KMT2ATHRBTSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115509088-A Ester type photosensitive polyimide composite material, preparation method and semiconductor device 深圳先进电子材料国际创新研究院 2022-12-23 CN disclosed
EP-2512978-B1 CAST POLYMER LAYER WITH HIGH ASPECT RATIO SICPA HOLDING SA (CH) 2015-08-19 EP disclosed
US-20120295083-A1 PATTERNED POLYMER LAYER WITH HIGH ASPECT RATIO OLIVETTI-JET S.P.A. (IT) 2012-11-22 US disclosed
EP-2512978-A1 CAST POLYMER LAYER WITH HIGH ASPECT RATIO OLIVETTI S.p.A. (IT) 2012-10-24 EP disclosed
WO-2011072713-A1 CAST POLYMER LAYER WITH HIGH ASPECT RADIO TELECOM ITALIA S.P.A. (IT) 2011-06-23 WO disclosed