SCHEMBL2018581

SCHEMBL2018581

CC(C)(O)NCCN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28354717 0.85 CA12 (0.52)
SCHEMBL9950060 0.85 CA12 (0.52)
SCHEMBL5911170 0.83
SCHEMBL6333135 0.82
SCHEMBL7084623 0.81 ALDH1A1 (0.35)
SCHEMBL1234598 0.80
SCHEMBL29141430 0.79 PAOX (0.45)
SCHEMBL2128837 0.78 KIF11 (0.32)
SCHEMBL22019485 0.77
SCHEMBL11454997 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111566735-B Method for manufacturing aluminum magnetic disk 花王株式会社 2022-06-03 CN claimed
CN-105087182-B Circuit board having solder solidified thereon, method for producing circuit board having electronic component mounted thereon, and cleaning agent composition for flux 花王株式会社 2020-08-14 CN claimed
CN-109939977-A Resin mask removes cleaning method 花王株式会社 2019-06-28 CN claimed
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
CN-104159977-B Thermoplastic resin composition 日本乳化剂株式会社 2017-09-12 CN claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
CN-104877811-A Detergent composition stoste, detergent composition, cleaning method and application ARAKAWA CHEM IND 2015-09-02 CN claimed
CN-102272675-A A photoresist image-forming process using double patterning 2011-12-07 CN claimed
US-20110155690-A1 POLISHING METHOD KAO CORPORATION (JP) 2011-06-30 US claimed
CN-1846173-B Liquid photoresist remover composition, process for producing pattern with the same, and display employing the same SONY CORP 2011-01-19 CN claimed
US-20100183851-A1 Photoresist Image-forming Process Using Double Patterning CAO YI 2010-07-22 US claimed
CN-100405633-C Method of manufacturing a laminated structure, laminated structure, display device and display unit with laminated structure SONY CORP (JP) 2008-07-23 CN claimed
CN-1846173-A Liquid photoresist remover composition, process for producing pattern with the same, and display employing the same SONY CORP (JP) 2006-10-11 CN claimed
CN-1575057-A Method of manufacturing a laminated structure, laminated structure, display device and display unit with laminated structure SONY CORP (JP) 2005-02-02 CN claimed
US-20050007015-A1 Method of manufacturing laminated structure, laminated structure, display device and display unit SONY CORPORATION (JP) 2005-01-13 US claimed
EP-1482572-A1 Method of manufacturing a laminated structure, laminated structure, display device and display unit with laminated structure SONY CORPORATION (JP) 2004-12-01 EP claimed
EP-0115072-B1 ADDITION PRODUCTS FROM OLEFINICALLY UNSATURATED POLYESTER-POLYOLS AND ALKYLENE POLYAMINES, PROCESS FOR THEIR PREPARATION ANALOGOUS TO THE MICHAEL-REACTION, THEIR USE AS AN ADDITIVE FOR SYNTHETIC RESINS ON ISOCYANATE BASE AND FOR THE PREPARATION OF POLYISOCYANURATE FOAMS CONTAINING POLYURETHANE GROUPS BASF Aktiengesellschaft (DE) 1986-07-16 EP claimed
EP-0115072-A1 Addition products from olefinically unsaturated polyester-polyols and alkylene polyamines, process for their preparation analogous to the Michael-reaction, their use as an additive for synthetic resins on isocyanate base and for the preparation of polyisocyanurate foams containing polyurethane groups BASF Aktiengesellschaft (DE) 1984-08-08 EP claimed
EP-0080165-B1 LACQUER BINDERS FOR CATHODIC ELECTROCOATING, AND THEIR USE BASF Aktiengesellschaft (DE) 1984-07-18 EP claimed
EP-0080165-A1 Lacquer binders for cathodic electrocoating, and their use BASF Aktiengesellschaft (DE) 1983-06-01 EP claimed