SCHEMBL20192287

SCHEMBL20192287

CC(C)C(C)(C)C(=O)OCCOC(=O)C(F)(F)C(F)(F)C(F)(F)OC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.37

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 6/20 0.37
CYP19A1 P11511 6/20 0.37
PRKCA P17252 1/20 0.34
ALDH1A1 P00352 4/20 0.34
NPSR1 Q6W5P4 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 2/20 0.33
PKM P14618 1/20 0.32
ATM Q13315 1/20 0.31
GABBR2 O75899 1/20 0.31
GABBR1 Q9UBS5 1/20 0.31
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17550546 0.89 PRKCA (0.35) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17550600 0.89 CYP17A1 (0.39) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17545787 0.86 CYP17A1 (0.33) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17545692 0.86 CYP17A1 (0.37) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17550543 0.82 PRKCA (0.36) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17550547 0.82 CYP17A1 (0.40) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL16547493 0.79 CYP17A1 (0.34) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL16547495 0.79 CYP17A1 (0.38) CYP17A1CYP19A1PRKCAALDH1A1NPSR1
SCHEMBL17831322 0.77
SCHEMBL18826929 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230139896-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-04 US disclosed
US-9983478-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-05-29 US disclosed