SCHEMBL17550600

SCHEMBL17550600

CC(C)(C)C(=O)OCCOC(=O)C(F)(F)C(F)(F)C(F)(F)OC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 3/20 0.39
CYP19A1 P11511 3/20 0.39
ALDH1A1 P00352 7/20 0.36
NPSR1 Q6W5P4 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
MAPT P10636 1/20 0.35
PRKCA P17252 1/20 0.34
SCN1A P35498 1/20 0.34
SCN2A Q99250 1/20 0.34
SCN3A Q9NY46 1/20 0.34
ATM Q13315 1/20 0.33
LMNA P02545 1/20 0.32
TSHR P16473 1/20 0.32
RECQL P46063 1/20 0.31
PKM P14618 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17550547 0.92 CYP17A1 (0.40) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL17545692 0.89 CYP17A1 (0.37) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL20192287 0.89 CYP17A1 (0.37) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL17550546 0.88 PRKCA (0.35) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL18826929 0.87
SCHEMBL17545787 0.85 CYP17A1 (0.33) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL17550539 0.84 CYP17A1 (0.42) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL16547495 0.81 CYP17A1 (0.38) CYP17A1CYP19A1ALDH1A1NPSR1MEN1
SCHEMBL18467708 0.81 LMNA (0.33) ALDH1A1NPSR1MEN1KMT2AMAPT
SCHEMBL17550595 0.81 ALDH1A1 (0.49) CYP17A1CYP19A1ALDH1A1NPSR1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760005-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-12 US disclosed
US-9671692-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-25 US disclosed
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-19 US disclosed
US-20160131971-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-12 US disclosed
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN XDH, HAX1, MLX CYP17A1 119/4885CYP19A1 328/4885ALDH1A1 2530/4885
US-20160244400-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION C1R, KISS1R, C1S CYP17A1 1410/4885CYP19A1 757/4885ALDH1A1 543/4885
US-20160131971-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, RXRA, C1R CYP17A1 2057/4885CYP19A1 923/4885ALDH1A1 428/4885
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, AFF4 CYP17A1 1257/4885CYP19A1 630/4885ALDH1A1 1178/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.