SCHEMBL2020539

SCHEMBL2020539

CC(C)O[Ti+3].CC(C)O[Ti+3].[O-2].[O-2].[O-2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29566379 0.95
Hydrochloric Acid SCHEMBL1361615 0.90
Iodide SCHEMBL1960465 0.90
SCHEMBL2044280 0.90
SCHEMBL28555659 0.63 CTSA (0.33)
SCHEMBL446987 0.63
Bromide SCHEMBL11129901 0.60
Hydrochloric Acid SCHEMBL2401664 0.60
SCHEMBL901487 0.60
Hydrochloric Acid SCHEMBL1361619 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8420166-B2 Method for preparing patterned metal oxide layer or patterned metal layer by using solution type precursor or sol-gel precursor NATIONAL TSING HUA UNIVERSITY (TV) 2013-04-16 US claimed
US-20110156320-A1 Method for preparing patterned metal oxide layer or patterned metal layer by using solution type precursor or sol-gel precursor NATIONAL TSING HUA UNIVERSITY (TW) 2011-06-30 US claimed
CN-119257969-A Skin-nourishing and skin-holding foundation liquid for oily skin 华美康妍(苏州)生物科技有限公司 2025-01-07 CN disclosed