⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3414547 | 0.80 | — | — | |
| SCHEMBL3414541 | 0.80 | — | — | |
| SCHEMBL18987229 | 0.78 | — | — | |
| SCHEMBL249129 | 0.78 | — | — | |
| SCHEMBL2896531 | 0.78 | — | — | |
| SCHEMBL9176874 | 0.78 | — | — | |
| SCHEMBL17474255 | 0.77 | — | — | |
| Ethylene SCHEMBL27762520 | 0.77 | — | — | |
| SCHEMBL5858227 | 0.75 | — | — | |
| SCHEMBL6562280 | 0.74 | L3MBTL1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7968463-B2 | Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer | RENESAS ELECTRONICS CORPORATION (JP) | 2011-06-28 | — | — | US | disclosed |
| US-20100084713-A1 | Semiconductor device manufacturing method and semiconductor device | NEC CORPORATION (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20090170252-A1 | Formation method of metallic compound layer, manufacturing method of semiconductor device, and formation apparatus for metallic compound layer | RENESAS ELECTRONICS CORPORATION (JP) | 2009-07-02 | — | — | US | disclosed |