Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.36 |
| ▸ | HTT | P42858 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | GUSB | P08236 | 1/20 | 0.30 |
| ▸ | PARG | Q86W56 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28195586 | 0.87 | KDM4E (0.41) | GAAHTTALDH1A1KDM4ETSHR | |
| SCHEMBL3492989 | 0.82 | KDM4E (0.47) | GAAHTTALDH1A1KDM4ETSHR | |
| SCHEMBL11248471 | 0.80 | GAA (0.46) | GAAHTTALDH1A1THRBKDM4E | |
| SCHEMBL2229383 | 0.79 | GAA (0.42) | GAAHTTALDH1A1THRBMAPT | |
| SCHEMBL9184322 | 0.76 | MEN1 (0.43) | ALDH1A1KDM4ETSHRMAPTHPGD | |
| SCHEMBL9177752 | 0.76 | ALDH1A1 (0.56) | GAAHTTALDH1A1KDM4ETSHR | |
| SCHEMBL10498975 | 0.75 | MAPT (0.46) | GAAHTTALDH1A1THRBKDM4E | |
| SCHEMBL8283681 | 0.73 | MEN1 (0.43) | GAAHTTALDH1A1KDM4ETSHR | |
| SCHEMBL932125 | 0.72 | TDP1 (0.40) | ALDH1A1KDM4EMAPTHPGDHSD17B10 | |
| SCHEMBL31310613 | 0.72 | KDM4E (0.44) | GAAALDH1A1KDM4ETSHRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2121324-B1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK CO (US) | 2014-06-04 | — | — | EP | claimed |
| US-20130008331-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2013-01-10 | — | — | US | claimed |
| WO-2011113693-A1 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2011-09-22 | — | — | WO | claimed |
| EP-2121324-A1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK COMPANY (US) | 2009-11-25 | — | — | EP | claimed |
| US-7544462-B2 | Radiation-sensitive composition and elements with basic development enhancers | EASTMAN KODAK COMPANY (US) | 2009-06-09 | — | — | US | claimed |
| US-20080206678-A1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK COMPANY | 2008-08-28 | — | — | US | claimed |
| WO-2008103258-A1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK COMPANY (US) | 2008-08-28 | — | — | WO | claimed |
| EP-3429864-B1 | METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE | ECO3 BV (BE) | 2025-11-19 | — | — | EP | disclosed |
| US-20220288916-A1 | Method for Processing a Lithographic Printing Plate | AGFA OFFSET BE (BE) | 2022-09-15 | — | — | US | disclosed |
| EP-4013621-A1 | METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE | AGFA OFFSET BV (BE) | 2022-06-22 | — | — | EP | disclosed |
| EP-3429852-B1 | METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE | AGFA NV (BE) | 2021-11-10 | — | — | EP | disclosed |
| EP-3429851-B1 | METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE | AGFA NV (BE) | 2021-08-18 | — | — | EP | disclosed |
| EP-3429848-B1 | METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE | AGFA NV (BE) | 2021-08-18 | — | — | EP | disclosed |
| WO-2009085093-A1 | RADIATION-SENSITIVE ELEMENTS WITH DEVELOPABILITY-ENHANCING COMPOUNDS | EASTMAN KODAK COMPANY (US) | 2009-07-09 | — | — | WO | disclosed |
| US-20090162783-A1 | RADIATION-SENSITIVE ELEMENTS WITH DEVELOPABILITY-ENHANCING COMPOUNDS | BANK OF AMERICA, N.A., AS AGENT | 2009-06-25 | — | — | US | disclosed |
| US-7544462-B2 | Radiation-sensitive composition and elements with basic development enhancers | EASTMAN KODAK COMPANY (US) | 2009-06-09 | — | — | US | disclosed |
| WO-2008106010-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS | EASTMAN KODAK COMPANY (US) | 2008-09-04 | — | — | WO | disclosed |
| US-20080206678-A1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK COMPANY | 2008-08-28 | — | — | US | disclosed |
| WO-2008103258-A1 | RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH BASIC DEVELOPMENT ENHANCERS | EASTMAN KODAK COMPANY (US) | 2008-08-28 | — | — | WO | disclosed |
| US-7399576-B1 | To prepare imageable elements useful to make lithographic printing plates; coating quality and less surface defects; friction between the outermost imageable layer and overlying interleaf papers used in stacks of elements is optimized so that the stacks of plates are sliding during transportation | EASTMAN KODAK COMPANY (US) | 2008-07-15 | — | — | US | disclosed |