Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 7/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.56 |
| ▸ | USP2 | O75604 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 6/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.55 |
| ▸ | ATM | Q13315 | 5/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.55 |
| ▸ | S1PR4 | O95977 | 2/20 | 0.55 |
| ▸ | S1PR1 | P21453 | 2/20 | 0.55 |
| ▸ | GAA | P10253 | 2/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.55 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.53 |
| ▸ | EGFR | P00533 | 1/20 | 0.52 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
| ▸ | PDE5A | O76074 | 6/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28152939 | 1.00 | MEN1 (0.56) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL9359545 | 1.00 | MEN1 (0.56) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL28932534 | 0.97 | MEN1 (0.55) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL10702700 | 0.95 | MEN1 (0.52) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL2253846 | 0.94 | MEN1 (0.53) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL2252517 | 0.93 | MEN1 (0.58) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL9707149 | 0.92 | MEN1 (0.49) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL11264406 | 0.92 | MEN1 (0.49) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL15301198 | 0.92 | MEN1 (0.49) | MEN1KMT2AUSP2TDP1MAPT | |
| SCHEMBL10706545 | 0.89 | MEN1 (0.49) | MEN1KMT2AUSP2TDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112824973-A | Dry film resist laminate | 浙江福斯特新材料研究院有限公司 | 2021-05-21 | — | — | CN | claimed |
| CN-106909026-B | A kind of anti-corrosion agent composition that can directly describe exposure image and resist layer laminate | 苏州福斯特光伏材料有限公司 | 2019-11-22 | — | — | CN | claimed |
| CN-102375341-B | The manufacture method of photosensitive polymer combination, element, resist figure and lead frame, printed-wiring board (PWB) and manufacture method thereof | HITACHI CHEMICAL CO., LTD. (JP) | 2016-04-06 | — | — | CN | claimed |
| WO-2026100065-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 株式会社レゾナック | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| EP-4692936-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | Resonac Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4685561-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | Resonac Corporation (JP) | 2026-01-28 | — | — | EP | disclosed |
| US-20260016749-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORP (JP) | 2026-01-15 | — | — | US | disclosed |
| EP-4679172-A1 | METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | Resonac Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| EP-4675350-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | Resonac Corporation (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-4431722-A | POLYCYCLIC QUINONE PIGMENT DISPERSED IN A RESIN BINDER AS CHARGE GENERATING LAYER; ANTIFOGGING AGENTS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-02-14 | — | — | US | disclosed |
| US-4421838-A | REDUCTION OF SELENIUM COMPOUND IN DIELECTRIC POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1983-12-20 | — | — | US | disclosed |
| US-4361638-A | AMORPHOUS SILICON AND CARBON BASE MATERIAL DOPED WITH HYDROGEN AND FLUORINE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-30 | — | — | US | disclosed |
| US-4356246-A | GLOW DISCHARGE, FROM SILANE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-10-26 | — | — | US | disclosed |
| US-4356244-A | Quinoxaline cyanine dye sensitized organic electron donor compounds | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-10-26 | — | — | US | disclosed |
| US-4349617-A | Function separated type electrophotographic light-sensitive members and process for production thereof | FUJI PHOTO FILM CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |
| US-4250053-A | WITH FLUORESCENT COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-02-10 | — | — | US | disclosed |
| US-3989860-A | Repair technique for photoreceptors | XEROX CORPORATION (US) | 1976-11-02 | — | — | US | disclosed |
| US-3955977-A | GRAPHIC DISPLAYS | XEROX CORPORATION (US) | 1976-05-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | MEN1 1624/4885KMT2A 1333/4885USP2 3789/4885 |
| US-20260016749-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | CD79B, KDM2B, RARB | MEN1 3889/4885KMT2A 1069/4885USP2 3218/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.