SCHEMBL20274264

SCHEMBL20274264

CCc1cc(C(C)C)cc(C(C)C)c1C(=O)O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 2/20 0.72
FABP4 P15090 2/20 0.72
FABP5 Q01469 1/20 0.46
GABRA1 P14867 1/20 0.40
GABRB2 P47870 1/20 0.40
RXRA P19793 6/20 0.38
PPARG P37231 6/20 0.38
RARG P13631 5/20 0.38
ACE2 Q9BYF1 1/20 0.36
AKR1C3 P42330 1/20 0.35
AKR1C2 P52895 1/20 0.35
ABCC1 P33527 1/20 0.35
RARA P10276 1/20 0.34
RARB P10826 1/20 0.34
RXRB P28702 1/20 0.34
RXRG P48443 1/20 0.34
EIF4A3 P38919 2/20 0.34
PTPN1 P18031 1/20 0.34
PTPN11 Q06124 1/20 0.34
HSP90AA1 P07900 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL810177 0.85 FABP3 (1.00) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL17311830 0.83 FABP3 (0.96) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL16148313 0.78 FABP3 (0.78) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL11803468 0.76 GABRA1 (0.59) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL27898710 0.76 FABP3 (0.62) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL7484474 0.75 FABP4 (0.67) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL14519841 0.75 FABP4 (0.67) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL28708940 0.74 FABP3 (0.78) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL2383444 0.72 FABP4 (0.69) FABP3FABP4FABP5GABRA1GABRB2
SCHEMBL446680 0.72 FABP4 (0.69) FABP3FABP4FABP5GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3203319-B1 POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING PROCESS, AND COMPOUND SHINETSU CHEMICAL CO (JP) 2018-06-20 EP disclosed