Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 1.00 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 1.00 |
| ▸ | CYP3A4 | P08684 | 2/20 | 1.00 |
| ▸ | TSHR | P16473 | 1/20 | 1.00 |
| ▸ | MAOA | P21397 | 2/20 | 0.78 |
| ▸ | MAPT | P10636 | 6/20 | 0.74 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.74 |
| ▸ | MAOB | P27338 | 1/20 | 0.74 |
| ▸ | MEN1 | O00255 | 4/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.70 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.70 |
| ▸ | POLB | P06746 | 1/20 | 0.70 |
| ▸ | MITF | O75030 | 1/20 | 0.70 |
| ▸ | GAA | P10253 | 1/20 | 0.70 |
| ▸ | GFER | P55789 | 1/20 | 0.70 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.70 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.70 |
| ▸ | NPC1 | O15118 | 3/20 | 0.64 |
| ▸ | RAB9A | P51151 | 3/20 | 0.64 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.64 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1331804 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL2013073 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL41849 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL4455485 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL10576066 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL65211 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| SCHEMBL4446167 | 1.00 | ALDH1A1 (1.00) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| Hydrochloric Acid SCHEMBL8641976 | 0.97 | ALDH1A1 (0.93) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| Ammonia Solution, Strong SCHEMBL4071133 | 0.97 | ALDH1A1 (0.93) | ALDH1A1TDP1CYP3A4TSHRMAOA | |
| Ammonia Solution, Strong SCHEMBL2009106 | 0.97 | ALDH1A1 (0.93) | ALDH1A1TDP1CYP3A4TSHRMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3187 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260132256-A1 | POLYAMIC ACID COMPOSITION AND POLYIMIDE PREPARED WITH THE SAME | PI ADVANCED MAT CO LTD (KR) | 2026-05-14 | — | — | US | claimed |
| US-20260132262-A1 | BLACK POLYIMIDE FILM AND THE MANUFACTURING METHOD THEREOF | PI ADVANCED MAT CO LTD (KR) | 2026-05-14 | — | — | US | claimed |
| US-20260125577-A1 | SELF-LUBRICATING POLYIMIDE VARNISH AND POLYIMIDE COATING PREPARED THEREFROM | PI ADVANCED MAT CO LTD (KR) | 2026-05-07 | — | — | US | claimed |
| US-20260092194-A1 | POLYIMIDE VARNISH WITH IMPROVED PULSE ENDURANCE AND POLYIMIDE COATING MATERIAL PREPARED THEREOF | PI ADVANCED MAT CO LTD (KR) | 2026-04-02 | — | — | US | claimed |
| EP-4714998-A1 | POLYAMIC ACID COMPOSITION WITH IMPROVED ADHESION AND POLYIMIDE CURED PRODUCT COMPRISING THE SAME | PI Advanced Materials Co., Ltd. (KR) | 2026-03-25 | — | — | EP | claimed |
| US-20260062517-A1 | POLYAMIC ACID COMPOSITION WITH IMPROVED ADHESION AND POLYIMIDE CURED PRODUCT COMPRISING THE SAME | PI ADVANCED MAT CO LTD (KR) | 2026-03-05 | — | — | US | claimed |
| US-12522704-B2 | Polyimide film having high dimensional stability and manufacturing method therefor | PI ADVANCED MATERIALS CO., LTD. (KR) | 2026-01-13 | — | — | US | claimed |
| US-20260008935-A1 | POLYIMIDE FILM AND MANUFACTURING METHOD THEREFOR | PL ADVANCED MAT CO LTD (KR) | 2026-01-08 | — | — | US | claimed |
| US-12503596-B2 | Low-dielectric-constant polyimide composite powder, and method for producing same | PI ADVANCED MATERIALS CO., LTD. | 2025-12-23 | — | — | US | claimed |
| EP-4663711-A1 | METHOD OF OBTAINING INSULATING COATING COMPOSITION, COATING COMPOSITION AND CONDUCTIVE MATERIALS COMPRISING THE SAME | Weg Tintas LTDA (BR) | 2025-12-17 | — | — | EP | claimed |
| EP-0716113-B1 | Polyamic acid having three-dimensional network molecular structure, polyimide obtained therefrom and process for the preparation thereof | TOHO RAYON KK (JP) | 2000-01-19 | — | — | EP | claimed |
| EP-0418889-B1 | Polyamic acid having three-dimensional network molecular structure, polyimide obtained therefrom and process for the preparation thereof | TOHO RAYON KK (JP) | 1997-02-05 | — | — | EP | claimed |
| EP-0716113-A2 | Polyamic acid having three-dimensional network molecular structure, polyimide obtained therefrom and process for the preparation thereof | Toho Rayon Co., Ltd. (JP) | 1996-06-12 | — | — | EP | claimed |
| US-5478914-A | Polyimides and processes for preparaing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-12-26 | — | — | US | claimed |
| US-5459233-A | High temperature engineering aromatic polyimides | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1995-10-17 | — | — | US | claimed |
| US-5443859-A | Reacting tetracarboxylic acid dianhydride, aromatic diamine, optionally polyamine, to form polyamic acid, forming film, imidizing to form polyimide, carbonizing in inert gas or vacuum to form carbon film with specifed properties | TOHO RAYON CO., LTD. (JP) | 1995-08-22 | — | — | US | claimed |
| US-5399655-A | Acid-labile poly(amic acetal ester) | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-03-21 | — | — | US | claimed |
| US-5288843-A | Polymerizing 4,4'-bis(3-aminophenoxy)biphenyl, pyromellitic dianhydride and a different aromaticdiamine; engineering plastics; molding mateials; aerospace; heat resistance; melt processibility | MITSUI TOATSU CHEMICALS, INC. (JP) | 1994-02-22 | — | — | US | claimed |
| US-4381886-A | HYDRAZIDE-IMIDE COPOLYMER | HITACHI, LTD. (JP) | 1983-05-03 | — | — | US | claimed |
| US-4064107-A | High temperature polyurea resins | CELANESE CORPORATION (US) | 1977-12-20 | — | — | US | claimed |