⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5251994 | 0.91 | MAPT (0.31) | — | |
| SCHEMBL9700091 | 0.91 | ALDH1A1 (0.35) | — | |
| SCHEMBL749808 | 0.87 | MEN1 (0.39) | — | |
| SCHEMBL5892376 | 0.84 | PIK3CD (0.30) | — | |
| SCHEMBL24405445 | 0.83 | ALDH1A1 (0.38) | — | |
| SCHEMBL29315685 | 0.81 | — | — | |
| SCHEMBL35893 | 0.81 | — | — | |
| SCHEMBL10669154 | 0.80 | KDM4E (0.43) | — | |
| SCHEMBL11126746 | 0.79 | MEN1 (0.40) | — | |
| SCHEMBL9352426 | 0.79 | FDPS (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2507669-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8741542-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20120244472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| WO-2011065594-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-06-03 | — | — | WO | disclosed |
| US-4757105-A | Reacting water with organic polyisocyanate in the presence of an amine-containing emulsion stabilizer | BAYER AKTIENGESELLSCHAFT (DE) | 1988-07-12 | — | — | US | disclosed |
| US-4254025-A | Disazo and polyazo dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 1981-03-03 | — | — | US | disclosed |
| US-4234480-A | DIAZO, THIAZOLE, AND TRIAZOLE DYES; PAPER AND COTTON | BAYER AKTIENGESELLSCHAFT (DE) | 1980-11-18 | — | — | US | disclosed |