⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20312442 | 0.74 | KDM4E (0.34) | — | |
| SCHEMBL20312390 | 0.67 | HDAC8 (0.30) | — | |
| SCHEMBL1535070 | 0.67 | LPL (0.41) | — | |
| SCHEMBL20312437 | 0.66 | HSP90AA1 (0.32) | — | |
| SCHEMBL20312376 | 0.65 | MAPK1 (0.30) | — | |
| SCHEMBL20312439 | 0.64 | HSP90AA1 (0.34) | — | |
| SCHEMBL20312455 | 0.62 | SNCA (0.33) | — | |
| SCHEMBL20312451 | 0.62 | — | — | |
| SCHEMBL20312416 | 0.62 | KDM4E (0.35) | — | |
| SCHEMBL20188870 | 0.62 | NOS3 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10504732-B2 | Impurity diffusion agent composition and method for manufacturing semiconductor substrate | TOKYO OHKA KOGYO CO, LTD. (JP) | 2019-12-10 | — | — | US | disclosed |
| US-20180182624-A1 | IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180182624-A1 | IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |