Benzoic Acid

Benzoic Acid

SCHEMBL2032078

CCC(C)(C)C.O=C(O)c1ccccc1.O=C(O)c1ccccc1.O=C(O)c1ccccc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.64
DAO P14920 1/20 0.64
NAPRT Q6XQN6 1/20 0.64
CES1 P23141 5/20 0.54
CES2 O00748 4/20 0.54
SRD5A2 P31213 2/20 0.54
ALDH1A1 P00352 3/20 0.50
CYP1A2 P05177 2/20 0.48
POLB P06746 2/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
TP53 P04637 1/20 0.48
CYP2D6 P10635 1/20 0.46
CYP2C19 P33261 1/20 0.46
NPC1 O15118 1/20 0.45
CYP2C9 P11712 1/20 0.45
RAB9A P51151 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
PRSS1 P07477 1/20 0.44
CTSG P08311 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL6934526 1.00 TSHR (0.64) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL1288216 0.89 TSHR (0.50) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL11228092 0.87 TSHR (0.58) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL27397300 0.86 TSHR (0.64) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL11126820 0.86 TSHR (0.64) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL28693411 0.85 TSHR (0.78) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL28601772 0.85 TSHR (0.78) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL7999427 0.85 TSHR (0.78) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL9705228 0.85 TSHR (0.78) TSHRDAONAPRTCES1CES2
Benzoic Acid SCHEMBL2400344 0.85 TSHR (0.78) TSHRDAONAPRTCES1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021149732-A1 FLAME RETARDANT AGENT COMPOSITION, FLAME-RETARDANT RESIN COMPOSITION, AND MOLDED BODY 株式会社ADEKA 2021-07-29 WO disclosed
US-7968019-B2 Optical compensation film, method for producing optical compensation film, polarization plate and liquid crystal display KONICA MINOLTA OPTO, INC. (JP) 2011-06-28 US disclosed
US-20090239001-A1 OPTICAL FILM AND METHOD FOR PRODUCTION THEREOF KONICA MINOLTA OPTO, INC. (JP) 2009-09-24 US disclosed
US-20090169772-A1 RETARDATION FILM, METHOD FOR PRODUCING RETARDATION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY KONICA MINOLTA OPTO, INC. (JP) 2009-07-02 US disclosed
US-20060216437-A1 Optical compensation film, method for producing optical compensation film, polarization plate and liquid crystal display KONICA MINOLTA OPTO, INC. (JP) 2006-09-28 US disclosed
EP-1353988-B1 TRIMETHYLOLPROPANE ESTER-BASED PLASTICIZER COMPOSITION FOR POLYVINYL CHLORIDE RESIN LG CHEMICAL LTD (KR) 2006-04-19 EP disclosed
EP-1353988-A4 TRIMETHYLOLPROPANE ESTER-BASED PLASTICIZER COMPOSITION FOR POLYVINYL CHLORIDE RESIN LG CHEMICAL LTD (KR) 2005-01-19 EP disclosed
US-6831121-B2 Benzoic acid and 2-ethylhexanoic acid are added as raw materials to trimethylolpropane LG CHEM, LTD. (KR) 2004-12-14 US disclosed
EP-1134239-B1 Potentially hydrophilic resins and compositions comprising the same DAINICHISEIKA COLOR CHEM (JP) 2004-12-08 EP disclosed
EP-1353988-A1 TRIMETHYLOLPROPANE ESTER-BASED PLASTICIZER COMPOSITION FOR POLYVINYL CHLORIDE RESIN LG Chem Ltd. (KR) 2003-10-22 EP disclosed
US-20030065073-A1 Trimethylolpropane ester-based plasticizer composition for polyvinyl chloride resin LG CHEM, LTD. (KR) 2003-04-03 US disclosed
US-6465595-B1 COMPRISES AT LEAST MONOMER UNITS READILY SAPONIFIABLE UNDER ALKALINE CONDITIONS TO FORM CARBOXYL GROUPS (E.G., METHYL ACRYATE), AS WELL A MONOMERS CONTAINING CARBOXYLIC AND HYDROXYL GROUPS DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) 2002-10-15 US disclosed
WO-2002053635-A1 TRIMETHYLOLPROPANE ESTER-BASED PLASTICIZER COMPOSITION FOR POLYVINYL CHLORIDE RESIN LG CHEM, LTD. (KR) 2002-07-11 WO disclosed
EP-1134239-A1 Potentially hydrophilic resins and compositions comprising the same DAINICHISEIKA COLOR & CHEMICALS MFG. CO. LTD. (JP) 2001-09-19 EP disclosed