SCHEMBL2034199

SCHEMBL2034199

CCCC[Si]1(CCCC)CCCCC1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.33
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2034165 1.00 CYP1A2 (0.33) CYP1A2TSHRLMNATHRB
SCHEMBL2033055 0.97 TSHR (0.33) TSHRLMNATHRB
SCHEMBL2035694 0.92 TSHR (0.35) CYP1A2TSHRLMNATHRB
SCHEMBL2031734 0.92 TSHR (0.35) CYP1A2TSHRLMNATHRB
SCHEMBL2031513 0.92 TSHR (0.33) TSHRLMNATHRB
SCHEMBL2036500 0.89 TSHR (0.37) TSHRLMNATHRB
SCHEMBL15636774 0.85 TSHR (0.38) TSHRLMNATHRB
SCHEMBL2033455 0.83 TSHR (0.37) TSHRLMNATHRB
SCHEMBL2037026 0.82
SCHEMBL2038552 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8497391-B2 Insulating film material, method of film formation using insulating film material, and insulating film NATIONAL INSTITUTE FOR MATERIALS SCIENCE (JP) 2013-07-30 US disclosed
CN-102906865-A Low dielectric constant interlayer insulating film and method for forming low dielectric constant interlayer insulating film TAIYO NIPPON SANSO CORP 2013-01-30 CN disclosed
US-20120328798-A1 INTER-LOW-PERMITTIVITY LAYER INSULATING FILM, AND METHOD FOR FORMING INTER-LOW-PERMITTIVITY LAYER INSULATING FILM TRI CHEMICAL LABORATORIES INC. (JP) 2012-12-27 US disclosed
CN-101925690-B Insulating film material, film forming method using the insulating film material, and insulating film NAT INST FOR MATERIALS SCIENCE 2012-11-07 CN disclosed
US-20110130584-A1 INSULATING FILM MATERIAL, METHOD OF FILM FORMATION USING INSULATING FILM MATERIAL, AND INSULATING FILM NATIONAL INSTITUTE FOR MATERIALS SCIENCE (JP) 2011-06-02 US disclosed
CN-101925690-A Insulating film material, film forming method using the insulating film material, and insulating film NAT INST FOR MATERIALS SCIENCE 2010-12-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110130584-A1 INSULATING FILM MATERIAL, METHOD OF FILM FORMATION USING INSULATING FILM MATERIAL, AND INSULATING FILM C5, CFH, C9 CYP1A2 740/4885TSHR 4538/4885LMNA 2485/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.