SCHEMBL20342007

SCHEMBL20342007

CCC(=O)Oc1ccc(OCC=O)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.56
SMN1; SMN2 Q16637 3/20 0.56
ESR1 P03372 2/20 0.56
HIF1A Q16665 2/20 0.56
RECQL P46063 1/20 0.56
ELANE P08246 1/20 0.51
MAPT P10636 3/20 0.44
RAB9A P51151 3/20 0.44
NPC1 O15118 2/20 0.44
NFKB1 P19838 1/20 0.44
NFKB2 Q00653 1/20 0.44
RELA Q04206 1/20 0.44
ACHE P22303 2/20 0.44
LMNA P02545 3/20 0.43
HTT P42858 3/20 0.43
ALDH1A1 P00352 2/20 0.43
HSD17B10 Q99714 1/20 0.43
GAA P10253 1/20 0.42
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6666999 0.86 BCL9 (0.54) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL11261082 0.84 SMN1; SMN2 (0.54) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL312147 0.82 KMT2A (0.76) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL4758670 0.81 KMT2A (0.51) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL11445596 0.80 KMT2A (0.73) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL27864656 0.80 KMT2A (0.58) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL28707226 0.79 KMT2A (0.61) KMT2ASMN1; SMN2ESR1HIF1ARECQL
SCHEMBL12412448 0.78 KMT2A (0.48) KMT2ASMN1; SMN2RAB9ANPC1ACHE
SCHEMBL2726596 0.78 CA12 (0.42) SMN1; SMN2MAPTRAB9ALMNAHTT
SCHEMBL1564782 0.78 KMT2A (0.68) KMT2ASMN1; SMN2ESR1HIF1ARECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3343291-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2018-07-04 EP disclosed