SCHEMBL20344365

SCHEMBL20344365

Cc1cc(N)cc(I)c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.48
ALDH1A1 P00352 4/20 0.44
LMNA P02545 3/20 0.44
GAA P10253 3/20 0.44
KDM4E B2RXH2 2/20 0.44
MAPT P10636 2/20 0.44
PDE10A Q9Y233 1/20 0.44
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
TSHR P16473 4/20 0.39
CASP1 P29466 1/20 0.39
ALB P02768 1/20 0.39
PKM P14618 1/20 0.39
THRB P10828 1/20 0.39
HTT P42858 2/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
RPS6KA3 P51812 2/20 0.37
TP53 P04637 2/20 0.34
RAB9A P51151 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8439198 0.89 TTR (0.58) TTRALDH1A1LMNAGAAKDM4E
SCHEMBL655476 0.84 CA1 (0.58) TTRALDH1A1LMNAGAAKDM4E
Hydrochloric Acid SCHEMBL8565881 0.81 CA1 (0.55) TTRALDH1A1LMNAGAAKDM4E
Hydrochloric Acid SCHEMBL9690160 0.79 CA1 (0.52) TTRALDH1A1LMNAGAAKDM4E
Hydrochloric Acid SCHEMBL11824470 0.79 CA1 (0.52) TTRALDH1A1LMNAGAAKDM4E
SCHEMBL1285862 0.77 ALDH1A1 (0.65) ALDH1A1LMNAGAAKDM4EMAPT
SCHEMBL8811974 0.77 TSHR (0.52) ALDH1A1LMNAGAAKDM4EMAPT
SCHEMBL11388269 0.75 ALDH1A1 (0.56) TTRALDH1A1LMNAGAAKDM4E
SCHEMBL23907108 0.74 TTR (0.52) TTRALDH1A1LMNAGAAKDM4E
SCHEMBL815630 0.74 ALDH1A1 (0.54) TTRALDH1A1LMNAGAAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3343290-A1 LITHOGRAPHY MATERIAL AND MANUFACTURING METHOD THEREFOR, LITHOGRAPHY COMPOSITION, PATTERN FORMING METHOD, COMPOUND, RESIN, AND REFINING METHOD FOR COMPOUND AND RESIN A School Corporation Kansai University (JP) 2018-07-04 EP disclosed