SCHEMBL23907108

SCHEMBL23907108

Cc1cc(O)cc(I)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.52
CYP3A4 P08684 3/20 0.48
CHRM1 P11229 1/20 0.48
ALOX15 P16050 1/20 0.48
MAOA P21397 1/20 0.48
TBXA2R P21731 1/20 0.48
ADRA1A P35348 1/20 0.48
HTR2B P41595 1/20 0.48
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
ALB P02768 1/20 0.42
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
LMNA P02545 3/20 0.39
HTT P42858 2/20 0.39
ACHE P22303 2/20 0.38
HSP90AA1 P07900 1/20 0.38
ATM Q13315 1/20 0.38
KDM4E B2RXH2 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL71182 0.88 TTR (0.65) TTRCYP3A4CHRM1ALOX15MAOA
SCHEMBL22339 0.82 CA1 (0.65) TTRCYP3A4CHRM1ALOX15MAOA
SCHEMBL7875531 0.81 CYP3A4 (0.46) TTRCYP3A4CHRM1ALOX15MAOA
Ethane SCHEMBL27680247 0.79 CA1 (0.61) TTRCYP3A4CHRM1ALOX15MAOA
Methane SCHEMBL8857034 0.79 CA1 (0.61) TTRCYP3A4CHRM1ALOX15MAOA
SCHEMBL815630 0.78 ALDH1A1 (0.54) TTRCA1CA2ALBALDH1A1
SCHEMBL7873607 0.78 TTR (0.78) TTRMAOACA1CA2ALB
SCHEMBL16532790 0.77 CYP3A4 (0.42) TTRCYP3A4CHRM1ALOX15MAOA
SCHEMBL15901979 0.77 ALDH1A1 (0.45) TTRCYP3A4CHRM1ALOX15MAOA
SCHEMBL282435 0.77 CYP3A4 (0.52) TTRCYP3A4CHRM1ALOX15MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20220146935-A1 CARBOXYLATE, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-12 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed