SCHEMBL20372249

SCHEMBL20372249

C/C=C/C=C\C=C/CCC

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
TSHR P16473 2/20 0.41
CNR2 P34972 9/20 0.37
CNR1 P21554 7/20 0.37
TRPA1 O75762 1/20 0.36
TRPV1 Q8NER1 1/20 0.36
PPARA Q07869 2/20 0.34
PPARG P37231 1/20 0.34
PPARD Q03181 1/20 0.34
SOAT1 P35610 1/20 0.33
FASN P49327 1/20 0.31
PTPN2 P17706 1/20 0.31
PTPN1 P18031 1/20 0.31
PTPN11 Q06124 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL732602 1.00 ALDH1A1 (0.41) ALDH1A1TSHRCNR2CNR1TRPA1
SCHEMBL732601 1.00 ALDH1A1 (0.41) ALDH1A1TSHRCNR2CNR1TRPA1
SCHEMBL10282163 1.00 ALDH1A1 (0.41) ALDH1A1TSHRCNR2CNR1TRPA1
SCHEMBL730606 0.97
SCHEMBL6474983 0.97
SCHEMBL6480239 0.97
SCHEMBL6480405 0.97
SCHEMBL730605 0.97
SCHEMBL29291616 0.97
SCHEMBL16149704 0.90 ALDH1A1 (0.50) ALDH1A1TSHRCNR2CNR1TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3346335-A1 MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2018-07-11 EP disclosed